NITROGEN ION IMPLANTATION IN SILICON: STRUCTURE OF THE SUBSURFACE REGION.

Z. Liliental, R. W. Carpenter, D. Fathy, J. C. Kelly

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations
Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposia Proceedings
PublisherNorth-Holland
Pages525-530
Number of pages6
ISBN (Print)0444009051
StatePublished - Jan 1 1984

Publication series

NameMaterials Research Society Symposia Proceedings
Volume25
ISSN (Print)0272-9172

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Liliental, Z., Carpenter, R. W., Fathy, D., & Kelly, J. C. (1984). NITROGEN ION IMPLANTATION IN SILICON: STRUCTURE OF THE SUBSURFACE REGION. In Materials Research Society Symposia Proceedings (pp. 525-530). (Materials Research Society Symposia Proceedings; Vol. 25). North-Holland.