New approaches for simulation of wafer fabrication: The use of control variates and calibration metrics

Chanettre Rasmidatta, Shari Murray, John Fowler, Gerald T. Mackulak

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

Simulation-based wafer fabrication optimization models require extensive computational time to obtain accurate estimates of output parameters. This research seeks to develop goal-driven optimization methodologies for a variety of semiconductor manufacturing problems using appropriate combinations of "resource-driven" (R-D), "job-driven" (J-D), and Mixed (combination of R-D and J-D) models to reduce simulation run times. The initial phase of this research investigates two issues: a) the use of the R-D simulation control variates for the J-D simulation and b) development of metrics that calibrate the output from the R-D and J-D modeling paradigms. The use of the R-D model as a control variate is proposed to reduce the variance of J-D model output. Second, in order to use the R-D model output to predict the J-D model output, calibration metrics for the R-D and J-D modeling approaches were developed. Initial developments were tested using an M/M/1 queuing system and an M/D/1 queuing system.

Original languageEnglish (US)
Title of host publicationWinter Simulation Conference Proceedings
EditorsE. Yucesan, C.H. Chen, J.L. Snowdon, J.M. Charnes
Pages1414-1422
Number of pages9
Volume2
StatePublished - 2002
EventProceedings of the 2002 Winter Simulation Conference - San Diego, CA, United States
Duration: Dec 8 2002Dec 11 2002

Other

OtherProceedings of the 2002 Winter Simulation Conference
CountryUnited States
CitySan Diego, CA
Period12/8/0212/11/02

Fingerprint

Control Variates
Wafer
Fabrication
Calibration
Metric
Resources
Simulation
Output
Queuing System
Semiconductor Manufacturing
Model
Modeling
Optimization Model
Semiconductor materials
Paradigm
Predict
Optimization
Methodology

ASJC Scopus subject areas

  • Chemical Health and Safety
  • Software
  • Safety, Risk, Reliability and Quality
  • Applied Mathematics
  • Modeling and Simulation

Cite this

Rasmidatta, C., Murray, S., Fowler, J., & Mackulak, G. T. (2002). New approaches for simulation of wafer fabrication: The use of control variates and calibration metrics. In E. Yucesan, C. H. Chen, J. L. Snowdon, & J. M. Charnes (Eds.), Winter Simulation Conference Proceedings (Vol. 2, pp. 1414-1422)

New approaches for simulation of wafer fabrication : The use of control variates and calibration metrics. / Rasmidatta, Chanettre; Murray, Shari; Fowler, John; Mackulak, Gerald T.

Winter Simulation Conference Proceedings. ed. / E. Yucesan; C.H. Chen; J.L. Snowdon; J.M. Charnes. Vol. 2 2002. p. 1414-1422.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Rasmidatta, C, Murray, S, Fowler, J & Mackulak, GT 2002, New approaches for simulation of wafer fabrication: The use of control variates and calibration metrics. in E Yucesan, CH Chen, JL Snowdon & JM Charnes (eds), Winter Simulation Conference Proceedings. vol. 2, pp. 1414-1422, Proceedings of the 2002 Winter Simulation Conference, San Diego, CA, United States, 12/8/02.
Rasmidatta C, Murray S, Fowler J, Mackulak GT. New approaches for simulation of wafer fabrication: The use of control variates and calibration metrics. In Yucesan E, Chen CH, Snowdon JL, Charnes JM, editors, Winter Simulation Conference Proceedings. Vol. 2. 2002. p. 1414-1422
Rasmidatta, Chanettre ; Murray, Shari ; Fowler, John ; Mackulak, Gerald T. / New approaches for simulation of wafer fabrication : The use of control variates and calibration metrics. Winter Simulation Conference Proceedings. editor / E. Yucesan ; C.H. Chen ; J.L. Snowdon ; J.M. Charnes. Vol. 2 2002. pp. 1414-1422
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