New approaches for simulation of wafer fabrication: The use of control variates and calibration metrics

Chanettre Rasmidatta, Shari Murray, John Fowler, Gerald T. Mackulak

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

Simulation-based wafer fabrication optimization models require extensive computational time to obtain accurate estimates of output parameters. This research seeks to develop goal-driven optimization methodologies for a variety of semiconductor manufacturing problems using appropriate combinations of "resource-driven" (R-D), "job-driven" (J-D), and Mixed (combination of R-D and J-D) models to reduce simulation run times. The initial phase of this research investigates two issues: a) the use of the R-D simulation control variates for the J-D simulation and b) development of metrics that calibrate the output from the R-D and J-D modeling paradigms. The use of the R-D model as a control variate is proposed to reduce the variance of J-D model output. Second, in order to use the R-D model output to predict the J-D model output, calibration metrics for the R-D and J-D modeling approaches were developed. Initial developments were tested using an M/M/1 queuing system and an M/D/1 queuing system.

Original languageEnglish (US)
Title of host publicationWinter Simulation Conference Proceedings
EditorsE. Yucesan, C.H. Chen, J.L. Snowdon, J.M. Charnes
Pages1414-1422
Number of pages9
Volume2
StatePublished - 2002
EventProceedings of the 2002 Winter Simulation Conference - San Diego, CA, United States
Duration: Dec 8 2002Dec 11 2002

Other

OtherProceedings of the 2002 Winter Simulation Conference
CountryUnited States
CitySan Diego, CA
Period12/8/0212/11/02

ASJC Scopus subject areas

  • Chemical Health and Safety
  • Software
  • Safety, Risk, Reliability and Quality
  • Applied Mathematics
  • Modeling and Simulation

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    Rasmidatta, C., Murray, S., Fowler, J., & Mackulak, G. T. (2002). New approaches for simulation of wafer fabrication: The use of control variates and calibration metrics. In E. Yucesan, C. H. Chen, J. L. Snowdon, & J. M. Charnes (Eds.), Winter Simulation Conference Proceedings (Vol. 2, pp. 1414-1422)