New approach to silver halide photography using radical cation chemistry

Ian Gould, J. R. Lenhard, A. A. Muenter, S. A. Godleski, S. Farid

Research output: Contribution to journalArticle

14 Citations (Scopus)

Abstract

A new mechanism for spectral sensitization of silver halide is described, which can potentially double the sensitivity of photographic emulsions. The photooxidized sensitizing dye is trapped using an organic donor molecule, which fragments to form a cation and a reducing radical, which injects an electron into the conduction band of the silver halide. In this way, two conduction-band electrons can be produced for each absorbed photon.

Original languageEnglish (US)
Pages (from-to)455-458
Number of pages4
JournalPure and Applied Chemistry
Volume73
Issue number3
StatePublished - 2001

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Silver halides
Photography
Conduction bands
Cations
Photographic emulsions
Positive ions
Electrons
Coloring Agents
Photons
Dyes
Molecules

ASJC Scopus subject areas

  • Chemistry(all)

Cite this

Gould, I., Lenhard, J. R., Muenter, A. A., Godleski, S. A., & Farid, S. (2001). New approach to silver halide photography using radical cation chemistry. Pure and Applied Chemistry, 73(3), 455-458.

New approach to silver halide photography using radical cation chemistry. / Gould, Ian; Lenhard, J. R.; Muenter, A. A.; Godleski, S. A.; Farid, S.

In: Pure and Applied Chemistry, Vol. 73, No. 3, 2001, p. 455-458.

Research output: Contribution to journalArticle

Gould, I, Lenhard, JR, Muenter, AA, Godleski, SA & Farid, S 2001, 'New approach to silver halide photography using radical cation chemistry', Pure and Applied Chemistry, vol. 73, no. 3, pp. 455-458.
Gould I, Lenhard JR, Muenter AA, Godleski SA, Farid S. New approach to silver halide photography using radical cation chemistry. Pure and Applied Chemistry. 2001;73(3):455-458.
Gould, Ian ; Lenhard, J. R. ; Muenter, A. A. ; Godleski, S. A. ; Farid, S. / New approach to silver halide photography using radical cation chemistry. In: Pure and Applied Chemistry. 2001 ; Vol. 73, No. 3. pp. 455-458.
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