Abstract
In this paper, we describe a new method for creating nanostructures, and demonstrate its use by depositing Au, NJ, and Zn on a SiO2 passivated Si substrate. The method combined the spatial control of electron-beam lithography with the ease of fabrication of self-assembled arrays. The technique enabled the selective electrochemical deposition of nanostructures by creating specific nucleation sites by nanoindentation. This offered the possibility of accurately creating nanostructures ranging in size from one to hundreds of nanometers. We showed that it is possible to electrically isolate the nanostructures from the substrate and each other by a thermal oxidation process. In principle, this technique allowed fabrication of quantum devices of any geometry.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2684-2689 |
| Number of pages | 6 |
| Journal | Journal of Materials Research |
| Volume | 15 |
| Issue number | 12 |
| State | Published - Dec 2000 |
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ASJC Scopus subject areas
- Materials Science(all)
Cite this
Nanoscale mechanical patterning for the selective deposition of nanostructures. / Friesen, Cody; Hayes, J. R.
In: Journal of Materials Research, Vol. 15, No. 12, 12.2000, p. 2684-2689.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Nanoscale mechanical patterning for the selective deposition of nanostructures
AU - Friesen, Cody
AU - Hayes, J. R.
PY - 2000/12
Y1 - 2000/12
N2 - In this paper, we describe a new method for creating nanostructures, and demonstrate its use by depositing Au, NJ, and Zn on a SiO2 passivated Si substrate. The method combined the spatial control of electron-beam lithography with the ease of fabrication of self-assembled arrays. The technique enabled the selective electrochemical deposition of nanostructures by creating specific nucleation sites by nanoindentation. This offered the possibility of accurately creating nanostructures ranging in size from one to hundreds of nanometers. We showed that it is possible to electrically isolate the nanostructures from the substrate and each other by a thermal oxidation process. In principle, this technique allowed fabrication of quantum devices of any geometry.
AB - In this paper, we describe a new method for creating nanostructures, and demonstrate its use by depositing Au, NJ, and Zn on a SiO2 passivated Si substrate. The method combined the spatial control of electron-beam lithography with the ease of fabrication of self-assembled arrays. The technique enabled the selective electrochemical deposition of nanostructures by creating specific nucleation sites by nanoindentation. This offered the possibility of accurately creating nanostructures ranging in size from one to hundreds of nanometers. We showed that it is possible to electrically isolate the nanostructures from the substrate and each other by a thermal oxidation process. In principle, this technique allowed fabrication of quantum devices of any geometry.
UR - http://www.scopus.com/inward/record.url?scp=0034582921&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0034582921&partnerID=8YFLogxK
M3 - Article
AN - SCOPUS:0034582921
VL - 15
SP - 2684
EP - 2689
JO - Journal of Materials Research
JF - Journal of Materials Research
SN - 0884-2914
IS - 12
ER -