Abstract

In this paper, we describe a new method for creating nanostructures, and demonstrate its use by depositing Au, NJ, and Zn on a SiO2 passivated Si substrate. The method combined the spatial control of electron-beam lithography with the ease of fabrication of self-assembled arrays. The technique enabled the selective electrochemical deposition of nanostructures by creating specific nucleation sites by nanoindentation. This offered the possibility of accurately creating nanostructures ranging in size from one to hundreds of nanometers. We showed that it is possible to electrically isolate the nanostructures from the substrate and each other by a thermal oxidation process. In principle, this technique allowed fabrication of quantum devices of any geometry.

Original languageEnglish (US)
Pages (from-to)2684-2689
Number of pages6
JournalJournal of Materials Research
Volume15
Issue number12
StatePublished - Dec 2000

Fingerprint

Nanostructures
fabrication
nanoindentation
lithography
nucleation
electron beams
Fabrication
oxidation
Electron beam lithography
Substrates
Nanoindentation
geometry
Nucleation
Oxidation
Geometry

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Nanoscale mechanical patterning for the selective deposition of nanostructures. / Friesen, Cody; Hayes, J. R.

In: Journal of Materials Research, Vol. 15, No. 12, 12.2000, p. 2684-2689.

Research output: Contribution to journalArticle

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