D. K. Ferry, M. Khoury, D. P. Pivin, K. M. Connolly, T. K. Whidden, Michael Kozicki, David Allee

Research output: Contribution to journalArticle

6 Scopus citations


Nanolithography is the technology of fabricating sub-0.1 μm structures for use in either electronic devices or novel experiments in physics. While this has predominantly been the province of electron-beam lithography, new approaches explore the use of scanning probe techniques. Here, we discuss the limitations of electron-beam lithography, the development of novel SiO2 resists, and some uses of scanning-probe lithography.

Original languageEnglish (US)
Pages (from-to)1552-1557
Number of pages6
JournalSemiconductor Science and Technology
Issue number11 SUPPL. S
StatePublished - Nov 1996


ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

Cite this

Ferry, D. K., Khoury, M., Pivin, D. P., Connolly, K. M., Whidden, T. K., Kozicki, M., & Allee, D. (1996). Nanolithography. Semiconductor Science and Technology, 11(11 SUPPL. S), 1552-1557.