Nanolithography

D. K. Ferry; M. Khoury; D. P. Pivin; K. M. Connolly; T. K. Whidden; Michael Kozicki; David Allee

doi:10.1088/0268-1242/11/11S/017

Nanolithography

D. K. Ferry, M. Khoury, D. P. Pivin, K. M. Connolly, T. K. Whidden, Michael Kozicki, David Allee

Research output: Contribution to journal › Article › peer-review

8 Scopus citations

Abstract

Nanolithography is the technology of fabricating sub-0.1 μm structures for use in either electronic devices or novel experiments in physics. While this has predominantly been the province of electron-beam lithography, new approaches explore the use of scanning probe techniques. Here, we discuss the limitations of electron-beam lithography, the development of novel SiO₂ resists, and some uses of scanning-probe lithography.

Original language	English (US)
Pages (from-to)	1552-1557
Number of pages	6
Journal	Semiconductor Science and Technology
Volume	11
Issue number	11 SUPPL. S
DOIs	https://doi.org/10.1088/0268-1242/11/11S/017
State	Published - Nov 1996

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

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10.1088/0268-1242/11/11S/017

Cite this

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title = "Nanolithography",

abstract = "Nanolithography is the technology of fabricating sub-0.1 μm structures for use in either electronic devices or novel experiments in physics. While this has predominantly been the province of electron-beam lithography, new approaches explore the use of scanning probe techniques. Here, we discuss the limitations of electron-beam lithography, the development of novel SiO2 resists, and some uses of scanning-probe lithography.",

author = "Ferry, {D. K.} and M. Khoury and Pivin, {D. P.} and Connolly, {K. M.} and Whidden, {T. K.} and Michael Kozicki and David Allee",

year = "1996",

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T1 - Nanolithography

AU - Ferry, D. K.

AU - Khoury, M.

AU - Pivin, D. P.

AU - Connolly, K. M.

AU - Whidden, T. K.

AU - Kozicki, Michael

AU - Allee, David

PY - 1996/11

Y1 - 1996/11

N2 - Nanolithography is the technology of fabricating sub-0.1 μm structures for use in either electronic devices or novel experiments in physics. While this has predominantly been the province of electron-beam lithography, new approaches explore the use of scanning probe techniques. Here, we discuss the limitations of electron-beam lithography, the development of novel SiO2 resists, and some uses of scanning-probe lithography.

AB - Nanolithography is the technology of fabricating sub-0.1 μm structures for use in either electronic devices or novel experiments in physics. While this has predominantly been the province of electron-beam lithography, new approaches explore the use of scanning probe techniques. Here, we discuss the limitations of electron-beam lithography, the development of novel SiO2 resists, and some uses of scanning-probe lithography.

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U2 - 10.1088/0268-1242/11/11S/017

DO - 10.1088/0268-1242/11/11S/017

M3 - Article

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EP - 1557

JO - Semiconductor Science and Technology

JF - Semiconductor Science and Technology

IS - 11 SUPPL. S

ER -

Nanolithography

Abstract

ASJC Scopus subject areas

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