Nanolithography is the technology of fabricating sub-0.1 μm structures for use in either electronic devices or novel experiments in physics. While this has predominantly been the province of electron-beam lithography, new approaches explore the use of scanning probe techniques. Here, we discuss the limitations of electron-beam lithography, the development of novel SiO2 resists, and some uses of scanning-probe lithography.
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Electrical and Electronic Engineering
- Materials Chemistry