Nanochemistry, nanostructure, and electrical properties of Ta ₂O ₅ film deposited by atomic layer deposition and plasma-enhanced atomic layer deposition

Engineering & Materials Science

• Atomic layer deposition 100%
• Nanostructures 79%
• Electric properties 69%
• Plasmas 60%
• Electron energy loss spectroscopy 29%
• Oxides 28%
• High resolution transmission electron microscopy 26%
• Defect density 23%
• Charge density 22%
• Oxidants 20%
• Protons 19%
• Gases 18%
• Leakage currents 17%
• Electric potential 16%
• Hot Temperature 15%
• Capacitance 14%
• Water 8%

Physics & Astronomy

• atomic layer epitaxy 67%
• electrical properties 47%
• oxides 20%
• linkages 19%
• electric potential 17%
• stems 17%
• gases 16%
• leakage 13%
• energy dissipation 13%
• capacitance 13%
• breakdown 12%
• electron energy 12%
• transmission electron microscopy 10%
• protons 10%
• augmentation 9%
• high resolution 9%
• water 9%
• defects 9%
• spectroscopy 8%