Multi-dimensional simulations of the chemical vapor deposition for thermal barrier coatings using ZrCl4-H2-CO2-Ar gas mixtures

Venkatesh C. Vadakkapattu, Taewoo Lee

Research output: Contribution to journalArticle

2 Scopus citations

Abstract

Two- and three-dimensional simulations of the chemical vapor deposition processes for zirconia thermal barrier coating have been made using FLUENT. Validation runs in a simple reactor geometry yield results that match the experimental data for a range of temperature and pressure conditions. The two-dimensional models involving realistic inflow and outflow, along with a turbine blade located within for deposition, show details of the flow, thermal and chemical processes that can be used to optimize the deposition characteristics. However, some of the flow and deposition characteristics are only captured in full three-dimensional simulations where flow recirculation effects are observed. Thus, simulations of the zirconia chemical vapor deposition can be made with reasonable accuracy even with a simplified one-step reaction mechanism.

Original languageEnglish (US)
Pages (from-to)1065-1073
Number of pages9
JournalSurface and Coatings Technology
Volume201
Issue number3-4
DOIs
StatePublished - Oct 5 2006

Keywords

  • Chemical vapor deposition
  • Computational simulations
  • Thermal barrier coating

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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