Morphology and stability of (Ti_0.9Zr_0.1) Si₂ thin films on Si(111) and Si(100) formed in UHV

Engineering & Materials Science

• Ultrahigh vacuum 100%
• Thin films 60%
• Sheet resistance 19%
• Surface morphology 15%
• Temperature 14%
• Agglomeration 12%
• Surface roughness 11%
• Zirconium alloys 10%
• Silicides 9%
• Atomic force microscopy 9%
• Electron beams 8%
• Titanium alloys 7%
• Annealing 7%
• Scanning electron microscopy 5%
• Degradation 4%
• Experiments 2%

Chemical Compounds

• Vacuum 50%
• Liquid Film 30%
• Alloy 19%
• Sheet Resistance 17%
• Surface Roughness 14%
• Agglomeration 13%
• Zirconium Alloy 10%
• Titanium Alloy 8%
• Electron Beam 7%
• Surface 6%
• Atomic Force Microscopy 5%
• Annealing 5%
• Scanning Electron Microscopy 4%

Physics & Astronomy

• ultrahigh vacuum 63%
• thin films 32%
• agglomeration 15%
• surface roughness 11%
• zirconium alloys 9%
• temperature 8%
• titanium alloys 7%
• silicides 7%
• atomic force microscopy 5%
• wafers 5%
• electron beams 5%
• scanning electron microscopy 4%
• electrical resistivity 4%
• annealing 4%