Molecular dynamics simulations of mechanical deformation of amorphous silicon dioxide during chemical-mechanical polishing

Evgueni Chagarov, James Adams

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

The molecular dynamics simulations of mechanical deformation of amorphous silicon dioxide during chemical-mechanical polishing were analyzed. The simulations clarify asperity shape evolution during the process of shear and reveal temperature distributions as a function of time. An analytic model was developed for describing the amount of material removed as a function of asperity and particle radii and relative velocity.

Original languageEnglish (US)
Pages (from-to)3853-3861
Number of pages9
JournalJournal of Applied Physics
Volume94
Issue number6
DOIs
StatePublished - Sep 15 2003

Fingerprint

polishing
amorphous silicon
molecular dynamics
silicon dioxide
temperature distribution
simulation
shear
radii

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Molecular dynamics simulations of mechanical deformation of amorphous silicon dioxide during chemical-mechanical polishing. / Chagarov, Evgueni; Adams, James.

In: Journal of Applied Physics, Vol. 94, No. 6, 15.09.2003, p. 3853-3861.

Research output: Contribution to journalArticle

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