Molecular dynamics simulation of copper thin film growth on β-Ta (002) substrate

Youhong Li, James Adams

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Tantalum can be used both as a diffusion barrier and an adhesion layer for copper metallization for semiconductor devices. Experiments show that β-Ta (200) substrates promote (111) texture growth in copper films. In this study, we first create an embedded atom method (EAM) Cu-Ta potential developed by our force matching method (FMM); then the potential is used for Molecular Dynamics (MD) simulations of initial copper thin film growth on β-Ta substrates. Both Cu/Ta interracial structures and copper film structure are investigated. The relevance to (111) texturing is discussed.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsP.W. DeHaven, D.P. Field, S.D. Harkness IV, J.A. Sutliff, J.A. Szpunar, L Tang, T Thomson, M.D. Vaudin
Pages79-83
Number of pages5
Volume721
StatePublished - 2002
EventMagnetic and Electronic Films - Microstructure, Texture and Application to Data Storage - San Francisco, United States
Duration: Apr 1 2002Apr 4 2002

Other

OtherMagnetic and Electronic Films - Microstructure, Texture and Application to Data Storage
CountryUnited States
CitySan Francisco
Period4/1/024/4/02

Fingerprint

Film growth
Molecular dynamics
Copper
Thin films
Computer simulation
Substrates
Tantalum
Diffusion barriers
Texturing
Semiconductor devices
Metallizing
Adhesion
Textures
Atoms
Experiments

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Li, Y., & Adams, J. (2002). Molecular dynamics simulation of copper thin film growth on β-Ta (002) substrate. In P. W. DeHaven, D. P. Field, S. D. Harkness IV, J. A. Sutliff, J. A. Szpunar, L. Tang, T. Thomson, ... M. D. Vaudin (Eds.), Materials Research Society Symposium - Proceedings (Vol. 721, pp. 79-83)

Molecular dynamics simulation of copper thin film growth on β-Ta (002) substrate. / Li, Youhong; Adams, James.

Materials Research Society Symposium - Proceedings. ed. / P.W. DeHaven; D.P. Field; S.D. Harkness IV; J.A. Sutliff; J.A. Szpunar; L Tang; T Thomson; M.D. Vaudin. Vol. 721 2002. p. 79-83.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Li, Y & Adams, J 2002, Molecular dynamics simulation of copper thin film growth on β-Ta (002) substrate. in PW DeHaven, DP Field, SD Harkness IV, JA Sutliff, JA Szpunar, L Tang, T Thomson & MD Vaudin (eds), Materials Research Society Symposium - Proceedings. vol. 721, pp. 79-83, Magnetic and Electronic Films - Microstructure, Texture and Application to Data Storage, San Francisco, United States, 4/1/02.
Li Y, Adams J. Molecular dynamics simulation of copper thin film growth on β-Ta (002) substrate. In DeHaven PW, Field DP, Harkness IV SD, Sutliff JA, Szpunar JA, Tang L, Thomson T, Vaudin MD, editors, Materials Research Society Symposium - Proceedings. Vol. 721. 2002. p. 79-83
Li, Youhong ; Adams, James. / Molecular dynamics simulation of copper thin film growth on β-Ta (002) substrate. Materials Research Society Symposium - Proceedings. editor / P.W. DeHaven ; D.P. Field ; S.D. Harkness IV ; J.A. Sutliff ; J.A. Szpunar ; L Tang ; T Thomson ; M.D. Vaudin. Vol. 721 2002. pp. 79-83
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