Abstract
A physical model describing the dose rate response and the effect of hydrogen in bipolar technologies is presented. The model uses electron-hole pair recombination and competing hydrogen reactions to explain the behaviors of bipolar devices and circuits at different dose rates. Dose-rate-dependent computer simulations based on the model were performed, and the results provide excellent qualitative agreement with the dose rate data taken on both gated lateral pnp bipolar test transistors and LM193 bipolar dual-voltage comparators. The model presented in this paper can be used to explain a variety of factors that can influence device dose rate response in bipolar technologies.
Original language | English (US) |
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Article number | 5341365 |
Pages (from-to) | 3196-3202 |
Number of pages | 7 |
Journal | IEEE Transactions on Nuclear Science |
Volume | 56 |
Issue number | 6 |
DOIs | |
State | Published - Dec 1 2009 |
Keywords
- Bipolar oxide
- Dose rate
- Enhanced low dose rate sensitivity (ELDRS)
- Hydrogen
- Interface traps
- Radiation-induced
ASJC Scopus subject areas
- Nuclear and High Energy Physics
- Nuclear Energy and Engineering
- Electrical and Electronic Engineering