@inproceedings{f38d14c0081c4e9c915a78d2b1717c2e,
title = "Modeling of SiGe devices using a self-consistent full-band device simulator which properly takes into account quantum-mechanical size quantization and mobility enhancement",
abstract = "We examine performance enhancement off-channel SiGe devices using our recently developed particle-based device simulator that takes into account self-consistently the bandstructure and the quantum mechanical space-quantization and mobility enhancement (due to the smaller 2D density of states function) effects, We find surface roughness to be the dominant factor for the bad performance of p-channel SiGe devices when compared to conventional bulk p-MOSFETs at high bias conditions, At low and moderate bias conditions, when surface-roughness does not dominate the carrier transport, we observe performance enhancement in the operation of f-channel SiGe MOSFETs versus their conventional counter-parts. copyright The Electrochemical Society.",
author = "Dragica Vasileska and S. Krishnan and Fischetti, {M. V.}",
year = "2006",
doi = "10.1149/1.2355794",
language = "English (US)",
series = "ECS Transactions",
publisher = "Electrochemical Society Inc.",
number = "7",
pages = "55--66",
booktitle = "SiGe and Ge",
edition = "7",
note = "SiGe and Ge: Materials, Processing, and Devices - 210th Electrochemical Society Meeting ; Conference date: 29-10-2006 Through 03-11-2006",
}