Modeling of layout-dependent stress effect in CMOS design

Chi Chao Wang, Wei Zhao, Frank Liu, Min Chen, Yu Cao

Research output: Chapter in Book/Report/Conference proceedingConference contribution

26 Scopus citations

Abstract

Strain technology has been successfully integrated into CMOS fabrication to improve carrier transport properties since 90nm node. Due to the non-uniform stress distribution in the channel, the enhancement in carrier mobility, velocity, and threshold voltage shift strongly depend on circuit layout, leading to systematic performance variations among transistors. A compact stress model that physically captures this behavior is essential to bridge the process technology with design optimization. In this paper, starting from the first principle, a new layout-dependent stress model is proposed as a function of layout, temperature, and other device parameters. Furthermore, a method of layout decomposition is developed to partition the layout into a set of simple patterns for efficient model extraction. These solutions significantly reduce the complexity in stress modeling and simulation. They are comprehensively validated by TCAD simulation and published Si-data, including the state-of-the-art strain technologies and the STI stress effect. By embedding them into circuit analysis, the interaction between layout and circuit performance is well benchmarked at 45nm node.

Original languageEnglish (US)
Title of host publicationProceedings of the 2009 IEEE/ACM International Conference on Computer-Aided Design - Digest of Technical Papers, ICCAD 2009
Pages513-520
Number of pages8
StatePublished - Dec 1 2009
Event2009 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2009 - San Jose, CA, United States
Duration: Nov 2 2009Nov 5 2009

Publication series

NameIEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD
ISSN (Print)1092-3152

Other

Other2009 IEEE/ACM International Conference on Computer-Aided Design, ICCAD 2009
CountryUnited States
CitySan Jose, CA
Period11/2/0911/5/09

Keywords

  • Layout dependence
  • Mobility
  • Pattern decomposition
  • Stress effect
  • Stress modeling

ASJC Scopus subject areas

  • Software
  • Computer Science Applications
  • Computer Graphics and Computer-Aided Design

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  • Cite this

    Wang, C. C., Zhao, W., Liu, F., Chen, M., & Cao, Y. (2009). Modeling of layout-dependent stress effect in CMOS design. In Proceedings of the 2009 IEEE/ACM International Conference on Computer-Aided Design - Digest of Technical Papers, ICCAD 2009 (pp. 513-520). [5361246] (IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD).