Microstructural and micromagnetic characterization of thin film magnetic tunnel junctions

R. E. Dunin-Borkowski, Martha McCartney, David Smith, S. Gider, B. U. Runge, S. S P Parkin

Research output: Contribution to journalConference article

16 Scopus citations

Abstract

Combinations of high resolution electron microscopy, Lorentz microscopy, and off axis electron holography were used for the characterization of thin film magnetic tunnel junctions (MTJ). The MTJs contain CoPtCr hard ferromagnetic layers, alumina insulating barriers, and CoPt, Co, or NiFe soft ferromagnetic layers. The effect of annealing on the integrity of the alumina tunnel barrier were studied and the mechanism of magnetization decay of the hard layer following repeated reversal of the soft layers were addressed.

Original languageEnglish (US)
Pages (from-to)4815-4817
Number of pages3
JournalJournal of Applied Physics
Volume85
Issue number8 II A
StatePublished - Apr 15 1999
EventProceedings of the 43rd Annual Conference on Magnetism and Magnetic Materials - Miami, FL, USA
Duration: Nov 9 1998Nov 12 1998

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Microstructural and micromagnetic characterization of thin film magnetic tunnel junctions'. Together they form a unique fingerprint.

  • Cite this

    Dunin-Borkowski, R. E., McCartney, M., Smith, D., Gider, S., Runge, B. U., & Parkin, S. S. P. (1999). Microstructural and micromagnetic characterization of thin film magnetic tunnel junctions. Journal of Applied Physics, 85(8 II A), 4815-4817.