Microstructural and dielectric properties of high permittivity (Pb, Ba) ZrO3 thin films by sol-gel processing

Sandwip Dey, Robert Barz, Prashant Majhi, Chang Gong Wang

Research output: Contribution to journalArticlepeer-review

2 Scopus citations


High permittivity (Pb0.7, Ba0.3)ZrO3 (PBZ) films (60-110 nm) were fabricated by sol-gel processing on (111) Pt-passivated Si substrates, followed by rapid thermal annealing (RTA) at 550-700 °C for 5 minutes in oxygen. The randomly oriented grains were of the crystalline perovskite phase, with minor amounts of amorphous or nanocrystalline phase in the intergranular regions. The microstructure of the PBZ films was markedly influenced by substrate annealing and RTA temperature. At 10 kHz, the low-field dielectric permittivity and loss tangent of a 66 nm PBZ film were measured to be 932 and 0.03, respectively, giving a C/A of 12.5 μF/cm2.

Original languageEnglish (US)
Pages (from-to)L921-L924
JournalJapanese Journal of Applied Physics, Part 2: Letters
Issue number9 A/B
StatePublished - Sep 15 2000

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)


Dive into the research topics of 'Microstructural and dielectric properties of high permittivity (Pb, Ba) ZrO<sub>3</sub> thin films by sol-gel processing'. Together they form a unique fingerprint.

Cite this