Microstructural and chemical characterization of the Inconel/Ti(n) thin film and multilayer system

P. E. Diehl, Hans K. Pew, D. W. Madsen, John A. Leavitt, David Smith

Research output: Contribution to journalArticle

Abstract

Single layer and multilayer films of titanium and Inconel 600 (76 at.% Ni, 16 at.% Cr, 8 at.% Fe) have been prepared by sputtering in argon/nitrogen atmospheres, with nitrogen partial pressures ranging from 0% to 40%. The microstructure and chemistry of the sputtered films were characterized using transmission/high-resolution electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, secondary ion mass spectroscopy, electron probe microanalysis, and ion beam analysis with MeV helium beams. The microstructure depended on deposition power and individual layer thickness, as well as the sputtering atmosphere composition. Metal nitrides were formed in single layers of both materials whereas, for multilayers, nitrogen was preferentially incorporated into the titanium layer.

Original languageEnglish (US)
Pages (from-to)121-158
Number of pages38
JournalJournal of X-Ray Science and Technology
Volume5
Issue number1
DOIs
StatePublished - Jan 1 1995

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ASJC Scopus subject areas

  • Radiation
  • Instrumentation
  • Radiology Nuclear Medicine and imaging
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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