TY - GEN
T1 - Micromachined piezoelectric acoustic device
AU - Ren, Tian Ling
AU - Chen, Hao
AU - Yang, Yi
AU - Zhu, Yi Ping
AU - Fu, Di
AU - Wang, Chao
AU - Wu, Xiao Ming
AU - Cai, Jian
AU - Liu, Li Tian
AU - Li, Zhi Jian
PY - 2009/12/1
Y1 - 2009/12/1
N2 - Micromachined technology has been widely used to reduce device size and improve performance. In this paper, our research activities on micromachined piezoelectric acoustic devices at wide frequency range, from audio microphones to ultrasonic transducers, are reviewed. These devices are based on ferroelectric thin films, and exceed the conventional acoustic devices in excellent performance, miniaturized size, high reliability and compatibility with conventional integrated circuit fabrication. Resonance frequency can be determined by the thickness of each layer composing the thin film. Compact arrays of these devices are designed, fabricated and characterized to enhance sensitivity and pointing. Micromachined acoustic devices could find extensive applications in practical systems.
AB - Micromachined technology has been widely used to reduce device size and improve performance. In this paper, our research activities on micromachined piezoelectric acoustic devices at wide frequency range, from audio microphones to ultrasonic transducers, are reviewed. These devices are based on ferroelectric thin films, and exceed the conventional acoustic devices in excellent performance, miniaturized size, high reliability and compatibility with conventional integrated circuit fabrication. Resonance frequency can be determined by the thickness of each layer composing the thin film. Compact arrays of these devices are designed, fabricated and characterized to enhance sensitivity and pointing. Micromachined acoustic devices could find extensive applications in practical systems.
KW - Ferroelectric thin film
KW - MEMS
KW - Micromachined acoustic device
KW - PZT
KW - Ultrasonic transducer
UR - http://www.scopus.com/inward/record.url?scp=77949883522&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=77949883522&partnerID=8YFLogxK
U2 - 10.1109/EDST.2009.5166095
DO - 10.1109/EDST.2009.5166095
M3 - Conference contribution
AN - SCOPUS:77949883522
SN - 9781424438310
T3 - 2009 2nd International Workshop on Electron Devices and Semiconductor Technology, IEDST '09
BT - 2009 2nd International Workshop on Electron Devices and Semiconductor Technology, IEDST '09
T2 - 2009 2nd International Workshop on Electron Devices and Semiconductor Technology, IEDST '09
Y2 - 1 June 2009 through 2 June 2009
ER -