Abstract

Well-known cleanroom microfabrication technologies have been used to etch an aperture in silicon, pattern a capacitance reducing SU-8 layer and passivate the surface with polytetrafluoroethylene to form an integrated support to study specific ion channel proteins. The silicon support has demonstrated successful lipid bilayer sealing measurements with repeatable seal resistances in the gigaohm range. Characteristic measurements of OmpF porin ion channel proteins have been made.

Original languageEnglish (US)
Title of host publication2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings
EditorsM. Laudon, B. Romanowicz
Pages504-507
Number of pages4
StatePublished - Dec 1 2005
Event2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 - Anaheim, CA, United States
Duration: May 8 2005May 12 2005

Publication series

Name2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings

Other

Other2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005
CountryUnited States
CityAnaheim, CA
Period5/8/055/12/05

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Keywords

  • Ion channel
  • Microfabrication
  • Sensor

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Wilk, S. J., Goryll, M., Petrossian, L., Laws, G. M., Goodnick, S., Thornton, T., Saraniti, M., Tang, J. M., & Eisenberg, R. S. (2005). Microfabricated silicon apertures for ion channel measurement. In M. Laudon, & B. Romanowicz (Eds.), 2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings (pp. 504-507). (2005 NSTI Nanotechnology Conference and Trade Show - NSTI Nanotech 2005 Technical Proceedings).