Abstract
AlGaN/GaN test structures, with an etched constriction have been fabricated and tested with, and without, a gate. A pulsed voltage input with a 200 ns pulse width and a four-point measurement were used in a 50 Ω environment to determine the room temperature velocity-field characteristic of the structures. A low field mobility of 250 cm2/V s and an estimated electron velocity of ∼2 × 107 cm/s was attained at a field of 180 kV/cm.
Original language | English (US) |
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Pages (from-to) | 193-197 |
Number of pages | 5 |
Journal | Microelectronic Engineering |
Volume | 63 |
Issue number | 1-3 |
DOIs | |
State | Published - Aug 2002 |
Keywords
- AlGaN/GaN
- Drift velocity
- GaN
- High field transport
- Velocity-field characteristic
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Electrical and Electronic Engineering