Abstract
A new method to measure Debye Waller factors is reported in this article. The specimen analyzed is TiAl which was thinned by twin jet electropolishing. The measurement of the factors is necessary for the structure factor refinement in TiAl. It is aimed to get CBED pattern near a sparse zone axis, to extract line scans along HOLZ lines from the pattern. Two beam intensity is calculated to fit experiment and simulation by Debye Waller factor variations.
Original language | English (US) |
---|---|
Title of host publication | Proceedings - Annual Meeting, Microscopy Society of America |
Publisher | Publ by San Francisco Press Inc |
Pages | 698-699 |
Number of pages | 2 |
State | Published - 1993 |
Event | Proceedings of the 51st Annual Meeting Microscopy Society of America - Cincinnati, OH, USA Duration: Aug 1 1993 → Aug 6 1993 |
Other
Other | Proceedings of the 51st Annual Meeting Microscopy Society of America |
---|---|
City | Cincinnati, OH, USA |
Period | 8/1/93 → 8/6/93 |
ASJC Scopus subject areas
- Engineering(all)