Many-body semiclassical approximation for semiconductor plasmas

Alfred M. Kriman, Ravindra P. Joshi, David K. Ferry

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)

Abstract

Realistic simulations of semiconductor plasmas require detailed, many-species descriptions of the phonon and electronic systems. Limited numerical power then usually requires simplifying approximations. One approximation is the use of a screened Coulomb interaction. When an accurate screening function is not available, or when a better electrostatics treatment is needed, one can perform ensemble Monte Carlo (EMC) simulations that use a phase-space- trajectories or 'molecular dynamics' (MD) evolution of the electronic ensemble. In these EMC/MD simulations, Coulomb scattering events are treated continuously in the MD evolution of electron trajectories rather than by instantaneous scattering in EMC. Dynamic scattering effects are then included accurately by the explicit correlated motion of the electron ensemble. The electron trajectories simulated by MD have until recently been completely classical. We describe extensions of EMC/MD into the semiclassical regime, thus incorporating quantum effects such as position-momentum uncertainty. The method takes account of the Fermi statistics of the many-electron ensemble, yielding spin-dependent exchange contributions to the forces and effective mass. We describe effects of these corrections on the velocity autocorrelation function and on thermalization of satellite-valley electrons.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
Place of PublicationBellingham, WA, United States
PublisherPubl by Int Soc for Optical Engineering
Pages2-8
Number of pages7
Volume1677
ISBN (Print)0819408387
StatePublished - 1992
Externally publishedYes
EventUltrafast Laser Probe Phenomena in Semiconductors and Superconductors - Somerset, NJ, USA
Duration: Mar 24 1992Mar 25 1992

Other

OtherUltrafast Laser Probe Phenomena in Semiconductors and Superconductors
CitySomerset, NJ, USA
Period3/24/923/25/92

Fingerprint

Semiconductor plasmas
semiconductor plasmas
Molecular dynamics
molecular dynamics
Electrons
approximation
electron trajectories
Trajectories
Scattering
scattering
electrons
simulation
Coulomb interactions
Autocorrelation
electronics
autocorrelation
valleys
Electrostatics
Momentum
Screening

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Kriman, A. M., Joshi, R. P., & Ferry, D. K. (1992). Many-body semiclassical approximation for semiconductor plasmas. In Proceedings of SPIE - The International Society for Optical Engineering (Vol. 1677, pp. 2-8). Bellingham, WA, United States: Publ by Int Soc for Optical Engineering.

Many-body semiclassical approximation for semiconductor plasmas. / Kriman, Alfred M.; Joshi, Ravindra P.; Ferry, David K.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 1677 Bellingham, WA, United States : Publ by Int Soc for Optical Engineering, 1992. p. 2-8.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Kriman, AM, Joshi, RP & Ferry, DK 1992, Many-body semiclassical approximation for semiconductor plasmas. in Proceedings of SPIE - The International Society for Optical Engineering. vol. 1677, Publ by Int Soc for Optical Engineering, Bellingham, WA, United States, pp. 2-8, Ultrafast Laser Probe Phenomena in Semiconductors and Superconductors, Somerset, NJ, USA, 3/24/92.
Kriman AM, Joshi RP, Ferry DK. Many-body semiclassical approximation for semiconductor plasmas. In Proceedings of SPIE - The International Society for Optical Engineering. Vol. 1677. Bellingham, WA, United States: Publ by Int Soc for Optical Engineering. 1992. p. 2-8
Kriman, Alfred M. ; Joshi, Ravindra P. ; Ferry, David K. / Many-body semiclassical approximation for semiconductor plasmas. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 1677 Bellingham, WA, United States : Publ by Int Soc for Optical Engineering, 1992. pp. 2-8
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