Abstract

This paper investigates the properties of thin films of chromium-doped Ni80Fe20 (Permalloy) that could potentially be useful in future low-power magnetic memory technologies. The addition of chromium reduces the saturation magnetization, Ms, which is useful for low-energy switching, but does not significantly degrade the excellent switching properties of the host material even down to 10 K, the lowest temperature measured, in films as thin as 2.5 nm. As an example, an alloy film composed of 15% chromium and 85% Ni80Fe20 has an Ms just over half that of pure Ni80Fe20, with a coercivity Hc less than 4 Oe, an anisotropy field Hk less than 1 Oe, and an easy-axis remanent squareness Mr/Ms of 0.9 (where Mr is the remanent magnetization). Magnetodynamical measurements using a pulsed inductive microwave magnetometer showed that the average Landau Lifshitz damping λ was relatively constant with changing Cr content, but increased significantly for thinner films (λ ≈150 MHz for 11 nm, λ ≈250 MHz for 2.5 nm), and at low bias fields likely due to increased magnetic dispersion. Density functional theory calculations show that chromium reduces Ms by entering the lattice antiferromagnetically; it also increases scattering in the majority spin channel, while adding almost insignificant scattering to the minority channel.

Original languageEnglish (US)
Pages (from-to)193-202
Number of pages10
JournalJournal of Magnetism and Magnetic Materials
Volume460
DOIs
StatePublished - Aug 15 2018

Fingerprint

Chromium
chromium
Magnetic properties
magnetic properties
Thin films
thin films
magnetic dispersion
Scattering
magnetic storage
magnetization
Landau damping
Permalloys (trademark)
Magnetometers
Saturation magnetization
minorities
Coercive force
scattering
magnetometers
Density functional theory
coercivity

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics

Cite this

Magnetic properties of chromium-doped Ni80Fe20 thin films. / Devonport, Alex; Vishina, Alena; Singh, Rakesh; Edwards, Matthew; Zheng, Kaiwen; Domenico, John; Rizzo, N. D.; Kopas, Cameron; van Schilfgaarde, Mark; Newman, Nathan.

In: Journal of Magnetism and Magnetic Materials, Vol. 460, 15.08.2018, p. 193-202.

Research output: Contribution to journalArticle

Devonport, A, Vishina, A, Singh, R, Edwards, M, Zheng, K, Domenico, J, Rizzo, ND, Kopas, C, van Schilfgaarde, M & Newman, N 2018, 'Magnetic properties of chromium-doped Ni80Fe20 thin films', Journal of Magnetism and Magnetic Materials, vol. 460, pp. 193-202. https://doi.org/10.1016/j.jmmm.2018.03.054
Devonport A, Vishina A, Singh R, Edwards M, Zheng K, Domenico J et al. Magnetic properties of chromium-doped Ni80Fe20 thin films. Journal of Magnetism and Magnetic Materials. 2018 Aug 15;460:193-202. https://doi.org/10.1016/j.jmmm.2018.03.054
Devonport, Alex ; Vishina, Alena ; Singh, Rakesh ; Edwards, Matthew ; Zheng, Kaiwen ; Domenico, John ; Rizzo, N. D. ; Kopas, Cameron ; van Schilfgaarde, Mark ; Newman, Nathan. / Magnetic properties of chromium-doped Ni80Fe20 thin films. In: Journal of Magnetism and Magnetic Materials. 2018 ; Vol. 460. pp. 193-202.
@article{14e5d83da1e845d9abd9bf6e5d3257ec,
title = "Magnetic properties of chromium-doped Ni80Fe20 thin films",
abstract = "This paper investigates the properties of thin films of chromium-doped Ni80Fe20 (Permalloy) that could potentially be useful in future low-power magnetic memory technologies. The addition of chromium reduces the saturation magnetization, Ms, which is useful for low-energy switching, but does not significantly degrade the excellent switching properties of the host material even down to 10 K, the lowest temperature measured, in films as thin as 2.5 nm. As an example, an alloy film composed of 15{\%} chromium and 85{\%} Ni80Fe20 has an Ms just over half that of pure Ni80Fe20, with a coercivity Hc less than 4 Oe, an anisotropy field Hk less than 1 Oe, and an easy-axis remanent squareness Mr/Ms of 0.9 (where Mr is the remanent magnetization). Magnetodynamical measurements using a pulsed inductive microwave magnetometer showed that the average Landau Lifshitz damping λ was relatively constant with changing Cr content, but increased significantly for thinner films (λ ≈150 MHz for 11 nm, λ ≈250 MHz for 2.5 nm), and at low bias fields likely due to increased magnetic dispersion. Density functional theory calculations show that chromium reduces Ms by entering the lattice antiferromagnetically; it also increases scattering in the majority spin channel, while adding almost insignificant scattering to the minority channel.",
author = "Alex Devonport and Alena Vishina and Rakesh Singh and Matthew Edwards and Kaiwen Zheng and John Domenico and Rizzo, {N. D.} and Cameron Kopas and {van Schilfgaarde}, Mark and Nathan Newman",
year = "2018",
month = "8",
day = "15",
doi = "10.1016/j.jmmm.2018.03.054",
language = "English (US)",
volume = "460",
pages = "193--202",
journal = "Journal of Magnetism and Magnetic Materials",
issn = "0304-8853",
publisher = "Elsevier",

}

TY - JOUR

T1 - Magnetic properties of chromium-doped Ni80Fe20 thin films

AU - Devonport, Alex

AU - Vishina, Alena

AU - Singh, Rakesh

AU - Edwards, Matthew

AU - Zheng, Kaiwen

AU - Domenico, John

AU - Rizzo, N. D.

AU - Kopas, Cameron

AU - van Schilfgaarde, Mark

AU - Newman, Nathan

PY - 2018/8/15

Y1 - 2018/8/15

N2 - This paper investigates the properties of thin films of chromium-doped Ni80Fe20 (Permalloy) that could potentially be useful in future low-power magnetic memory technologies. The addition of chromium reduces the saturation magnetization, Ms, which is useful for low-energy switching, but does not significantly degrade the excellent switching properties of the host material even down to 10 K, the lowest temperature measured, in films as thin as 2.5 nm. As an example, an alloy film composed of 15% chromium and 85% Ni80Fe20 has an Ms just over half that of pure Ni80Fe20, with a coercivity Hc less than 4 Oe, an anisotropy field Hk less than 1 Oe, and an easy-axis remanent squareness Mr/Ms of 0.9 (where Mr is the remanent magnetization). Magnetodynamical measurements using a pulsed inductive microwave magnetometer showed that the average Landau Lifshitz damping λ was relatively constant with changing Cr content, but increased significantly for thinner films (λ ≈150 MHz for 11 nm, λ ≈250 MHz for 2.5 nm), and at low bias fields likely due to increased magnetic dispersion. Density functional theory calculations show that chromium reduces Ms by entering the lattice antiferromagnetically; it also increases scattering in the majority spin channel, while adding almost insignificant scattering to the minority channel.

AB - This paper investigates the properties of thin films of chromium-doped Ni80Fe20 (Permalloy) that could potentially be useful in future low-power magnetic memory technologies. The addition of chromium reduces the saturation magnetization, Ms, which is useful for low-energy switching, but does not significantly degrade the excellent switching properties of the host material even down to 10 K, the lowest temperature measured, in films as thin as 2.5 nm. As an example, an alloy film composed of 15% chromium and 85% Ni80Fe20 has an Ms just over half that of pure Ni80Fe20, with a coercivity Hc less than 4 Oe, an anisotropy field Hk less than 1 Oe, and an easy-axis remanent squareness Mr/Ms of 0.9 (where Mr is the remanent magnetization). Magnetodynamical measurements using a pulsed inductive microwave magnetometer showed that the average Landau Lifshitz damping λ was relatively constant with changing Cr content, but increased significantly for thinner films (λ ≈150 MHz for 11 nm, λ ≈250 MHz for 2.5 nm), and at low bias fields likely due to increased magnetic dispersion. Density functional theory calculations show that chromium reduces Ms by entering the lattice antiferromagnetically; it also increases scattering in the majority spin channel, while adding almost insignificant scattering to the minority channel.

UR - http://www.scopus.com/inward/record.url?scp=85045126705&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85045126705&partnerID=8YFLogxK

U2 - 10.1016/j.jmmm.2018.03.054

DO - 10.1016/j.jmmm.2018.03.054

M3 - Article

VL - 460

SP - 193

EP - 202

JO - Journal of Magnetism and Magnetic Materials

JF - Journal of Magnetism and Magnetic Materials

SN - 0304-8853

ER -