Magnetic and structural properties of high rate dual ion-beam sputtered NiFe films (invited)

NiFe films in the thickness range of 300 Å to 8 μm with excellent magnetic properties and thickness uniformity have been prepared using a newly developed high rate (up to 1000 Å/min) dual ion beam sputtering system. Deposition conditions such as the ion assist voltage, the target orientation and the partial pressure of nitrogen have been optimized to reduce coercivity H_c and stress as well as to improve film adhesion and film thermal stability. The annealing effects on H_c, the anisotropy field H _k, as well as the resistivity of the NiFe films were studied. X-ray diffraction and transmission electron microscopy techniques were used to characterize the microstructures of the films and were correlated with their magnetic properties. These ion-beam sputtered NiFe films have excellent magnetic, electrical, mechanical, and microstructural properties to make them suitable for thin-film head applications.