Local structural studies of TiSi2 and ZrSi2 thin films on Si(111) surfaces

Y. Dao, A. M. Edwards, D. E. Sayers, Robert Nemanich

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

This study explores the local structures of TiSi2 and ZrSi2 films on Si. The strain effect on the surface morphologies and phase stability of the films is investigated. Titanium silicide and zirconium silicide films were fabricated on atomically clean Si(111) substrates in UHV using electron gun evaporation followed by in situ annealing. A quantitative X-ray absorption spectroscopy analysis was performed to study the formation of epitaxial TiSi2 and ZrSi2 films on the Si surfaces, as well as the phase transition of TiSi2 from the metastable C49 structure to the stable C54 structure. The surface morphologies and the surface roughness of the films were studied using atomic force microscopy (AFM). The strains of these films were determined by comparing the calculated bond lengths with the measured bond lengths using the extended X-ray absorption fine structure (EXAFS) technique. The final stable C54 structure of TiSi2 has less strain than the initially formed metastable C49 phase. While the surface and interface free energies and the bulk free energy are critical to the structural formations and phase changes of the films, the energy associated with the lattice strain is another important factor.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
EditorsRobert W. Fathauer, Siegfried Mantl, Leo J. Schowalter, K.N. Tu
Place of PublicationPittsburgh, PA, United States
PublisherPubl by Materials Research Society
Pages367-372
Number of pages6
Volume320
ISBN (Print)1558992197
StatePublished - 1994
Externally publishedYes
EventProceedings of the 1993 Fall Meeting of the Materials Research Society - Boston, MA, USA
Duration: Nov 29 1993Dec 2 1993

Other

OtherProceedings of the 1993 Fall Meeting of the Materials Research Society
CityBoston, MA, USA
Period11/29/9312/2/93

Fingerprint

Thin films
Bond length
Free energy
Surface morphology
Electron guns
X ray absorption spectroscopy
Phase stability
Metastable phases
X ray absorption
Zirconium
Atomic force microscopy
Evaporation
Titanium
Surface roughness
Phase transitions
Annealing
Substrates

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Dao, Y., Edwards, A. M., Sayers, D. E., & Nemanich, R. (1994). Local structural studies of TiSi2 and ZrSi2 thin films on Si(111) surfaces. In R. W. Fathauer, S. Mantl, L. J. Schowalter, & K. N. Tu (Eds.), Materials Research Society Symposium Proceedings (Vol. 320, pp. 367-372). Pittsburgh, PA, United States: Publ by Materials Research Society.

Local structural studies of TiSi2 and ZrSi2 thin films on Si(111) surfaces. / Dao, Y.; Edwards, A. M.; Sayers, D. E.; Nemanich, Robert.

Materials Research Society Symposium Proceedings. ed. / Robert W. Fathauer; Siegfried Mantl; Leo J. Schowalter; K.N. Tu. Vol. 320 Pittsburgh, PA, United States : Publ by Materials Research Society, 1994. p. 367-372.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Dao, Y, Edwards, AM, Sayers, DE & Nemanich, R 1994, Local structural studies of TiSi2 and ZrSi2 thin films on Si(111) surfaces. in RW Fathauer, S Mantl, LJ Schowalter & KN Tu (eds), Materials Research Society Symposium Proceedings. vol. 320, Publ by Materials Research Society, Pittsburgh, PA, United States, pp. 367-372, Proceedings of the 1993 Fall Meeting of the Materials Research Society, Boston, MA, USA, 11/29/93.
Dao Y, Edwards AM, Sayers DE, Nemanich R. Local structural studies of TiSi2 and ZrSi2 thin films on Si(111) surfaces. In Fathauer RW, Mantl S, Schowalter LJ, Tu KN, editors, Materials Research Society Symposium Proceedings. Vol. 320. Pittsburgh, PA, United States: Publ by Materials Research Society. 1994. p. 367-372
Dao, Y. ; Edwards, A. M. ; Sayers, D. E. ; Nemanich, Robert. / Local structural studies of TiSi2 and ZrSi2 thin films on Si(111) surfaces. Materials Research Society Symposium Proceedings. editor / Robert W. Fathauer ; Siegfried Mantl ; Leo J. Schowalter ; K.N. Tu. Vol. 320 Pittsburgh, PA, United States : Publ by Materials Research Society, 1994. pp. 367-372
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