Laser shock induced nano-patterning of graphene

Ji Li; Gary J. Cheng; Rongjun Zhang; Hanqing Jiang

doi:10.1115/MSEC2012-7378

Laser shock induced nano-patterning of graphene

Ji Li, Gary J. Cheng, Rongjun Zhang, Hanqing Jiang

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

Nano-patterning of graphene film by a novel approach making use of laser ablation generated pressure is presented in this paper. Arrays of nanoscale holes were fabricated by applying laser shock pressure on graphene film suspending on well trenches in silicon substrate. Round holes with diameters ranging from 50 to 200 nm on graphene film were successfully punched. The critical pressure was found to be dependent on the diameter of holes. Smaller the diameters, higher critical pressure, which was also captured by the molecular dynamic (MD) simulations. The laser shock based approach presented in this paper provides an effective way to pattern graphene film with nanoscale features at an easy, fast and scalable manner.

Original language	English (US)
Title of host publication	ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conf. and in Participation with the Int. Conf., MSEC 2012
Pages	545-551
Number of pages	7
DOIs	https://doi.org/10.1115/MSEC2012-7378
State	Published - 2012
Event	ASME 2012 International Manufacturing Science and Engineering Conference, MSEC 2012 Collocated with the 40th North American Manufacturing Research Conference and in Participation with the International Conference - Notre Dame, IN, United States Duration: Jun 4 2012 → Jun 8 2012

Publication series

Name	ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conference and in Participation with the Int. Conf., MSEC 2012

Other

Other	ASME 2012 International Manufacturing Science and Engineering Conference, MSEC 2012 Collocated with the 40th North American Manufacturing Research Conference and in Participation with the International Conference
Country/Territory	United States
City	Notre Dame, IN
Period	6/4/12 → 6/8/12

ASJC Scopus subject areas

Industrial and Manufacturing Engineering

Access to Document

10.1115/MSEC2012-7378

Cite this

Li, J., Cheng, G. J., Zhang, R., & Jiang, H. (2012). Laser shock induced nano-patterning of graphene. In ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conf. and in Participation with the Int. Conf., MSEC 2012 (pp. 545-551). (ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conference and in Participation with the Int. Conf., MSEC 2012). https://doi.org/10.1115/MSEC2012-7378

Laser shock induced nano-patterning of graphene. / Li, Ji; Cheng, Gary J.; Zhang, Rongjun; Jiang, Hanqing.

ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conf. and in Participation with the Int. Conf., MSEC 2012. 2012. p. 545-551 (ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conference and in Participation with the Int. Conf., MSEC 2012).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Li, J, Cheng, GJ, Zhang, R & Jiang, H 2012, Laser shock induced nano-patterning of graphene. in ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conf. and in Participation with the Int. Conf., MSEC 2012. ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conference and in Participation with the Int. Conf., MSEC 2012, pp. 545-551, ASME 2012 International Manufacturing Science and Engineering Conference, MSEC 2012 Collocated with the 40th North American Manufacturing Research Conference and in Participation with the International Conference, Notre Dame, IN, United States, 6/4/12. https://doi.org/10.1115/MSEC2012-7378

Li J, Cheng GJ, Zhang R, Jiang H. Laser shock induced nano-patterning of graphene. In ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conf. and in Participation with the Int. Conf., MSEC 2012. 2012. p. 545-551. (ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conference and in Participation with the Int. Conf., MSEC 2012). https://doi.org/10.1115/MSEC2012-7378

Li, Ji ; Cheng, Gary J. ; Zhang, Rongjun ; Jiang, Hanqing. / Laser shock induced nano-patterning of graphene. ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conf. and in Participation with the Int. Conf., MSEC 2012. 2012. pp. 545-551 (ASME 2012 International Manufacturing Science and Engineering Conference Collocated with the 40th North American Manufacturing Research Conference and in Participation with the Int. Conf., MSEC 2012).

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abstract = "Nano-patterning of graphene film by a novel approach making use of laser ablation generated pressure is presented in this paper. Arrays of nanoscale holes were fabricated by applying laser shock pressure on graphene film suspending on well trenches in silicon substrate. Round holes with diameters ranging from 50 to 200 nm on graphene film were successfully punched. The critical pressure was found to be dependent on the diameter of holes. Smaller the diameters, higher critical pressure, which was also captured by the molecular dynamic (MD) simulations. The laser shock based approach presented in this paper provides an effective way to pattern graphene film with nanoscale features at an easy, fast and scalable manner.",

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AB - Nano-patterning of graphene film by a novel approach making use of laser ablation generated pressure is presented in this paper. Arrays of nanoscale holes were fabricated by applying laser shock pressure on graphene film suspending on well trenches in silicon substrate. Round holes with diameters ranging from 50 to 200 nm on graphene film were successfully punched. The critical pressure was found to be dependent on the diameter of holes. Smaller the diameters, higher critical pressure, which was also captured by the molecular dynamic (MD) simulations. The laser shock based approach presented in this paper provides an effective way to pattern graphene film with nanoscale features at an easy, fast and scalable manner.

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Laser shock induced nano-patterning of graphene

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