Kinetic lattice Monte Carlo simulation of facet growth rate

Zhiyong Wang, Youhong Li, James Adams

Research output: Contribution to journalArticle

54 Citations (Scopus)

Abstract

We present a kinetic lattice Monte Carlo simulation model that describes deposition, surface self-diffusion (including single adatom, dimer and ledge adatom diffusion), nucleation and film growth on fcc metal substrates. The activation energies for diffusion are calculated using the embedded-atom method. Using this model, we determine the relative growth rates of (100), (110) and (111) facets as a function of substrate temperature, deposition rate and facet size. The effects of relative growth rates on the microstructural evolution of Cu films are discussed.

Original languageEnglish (US)
Pages (from-to)51-63
Number of pages13
JournalSurface Science
Volume450
Issue number1
DOIs
StatePublished - Apr 1 2000

Fingerprint

flat surfaces
Adatoms
adatoms
Kinetics
kinetics
ledges
embedded atom method
simulation
Microstructural evolution
Film growth
Substrates
surface diffusion
Deposition rates
Dimers
Nucleation
Activation energy
Metals
dimers
nucleation
activation energy

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Kinetic lattice Monte Carlo simulation of facet growth rate. / Wang, Zhiyong; Li, Youhong; Adams, James.

In: Surface Science, Vol. 450, No. 1, 01.04.2000, p. 51-63.

Research output: Contribution to journalArticle

Wang, Zhiyong ; Li, Youhong ; Adams, James. / Kinetic lattice Monte Carlo simulation of facet growth rate. In: Surface Science. 2000 ; Vol. 450, No. 1. pp. 51-63.
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