TY - JOUR
T1 - Kinetic lattice Monte Carlo simulation of facet growth rate
AU - Wang, Zhiyong
AU - Li, Youhong
AU - Adams, James
N1 - Funding Information:
The authors wish to thank Len Borucki, Roland Stumpf, Chun-Li Liu, Xiang-Yang (Benjamin) Liu, and Bill Johnson of Motorola for many helpful discussions. We also thank David Richards for his assistance in guiding the development of the KLMC algorithms and code, and for many useful discussions. We thank S.F. Foiles, M.I. Baskes and M.S. Daw for use of the DYNAMO code. We thank NSF for funding this work through grant ASC97-40300. We thank NCSA for providing computational support on their SGI Origin cluster.
PY - 2000/4/1
Y1 - 2000/4/1
N2 - We present a kinetic lattice Monte Carlo simulation model that describes deposition, surface self-diffusion (including single adatom, dimer and ledge adatom diffusion), nucleation and film growth on fcc metal substrates. The activation energies for diffusion are calculated using the embedded-atom method. Using this model, we determine the relative growth rates of (100), (110) and (111) facets as a function of substrate temperature, deposition rate and facet size. The effects of relative growth rates on the microstructural evolution of Cu films are discussed.
AB - We present a kinetic lattice Monte Carlo simulation model that describes deposition, surface self-diffusion (including single adatom, dimer and ledge adatom diffusion), nucleation and film growth on fcc metal substrates. The activation energies for diffusion are calculated using the embedded-atom method. Using this model, we determine the relative growth rates of (100), (110) and (111) facets as a function of substrate temperature, deposition rate and facet size. The effects of relative growth rates on the microstructural evolution of Cu films are discussed.
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U2 - 10.1016/S0039-6028(99)01250-9
DO - 10.1016/S0039-6028(99)01250-9
M3 - Article
AN - SCOPUS:0033877539
SN - 0039-6028
VL - 450
SP - 51
EP - 63
JO - Surface Science
JF - Surface Science
IS - 1
ER -