Abstract
The ejection of F+ ions from fluorinated silicon by Ar+ or O2+ impact at 2-10 keV is shown to result from noncollisional processes which follow core-hole creation by the primary ion impact. The ejection mechanism is shown to be closely similar to electron-stimulated desorption, and can be explained using the model of Knotek and Feibelman. Cl+ ejection from chlorinated aluminum appears to result from a similar mechanism, whereas O+ ejection from oxygen-sputtered silicon appears to be purely collisional. The latter observation is shown to be consistent with the Knotek-Feibelman model.
Original language | English (US) |
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Pages (from-to) | 6187-6190 |
Number of pages | 4 |
Journal | Physical Review B |
Volume | 23 |
Issue number | 11 |
DOIs | |
State | Published - 1981 |
Externally published | Yes |
ASJC Scopus subject areas
- Condensed Matter Physics