Abstract

We are building a biosensor based on ion channels inserted into lipid bilayers that are suspended across an aperture in silicon. The process flow only involves conventional optical lithography and deep Si reactive ion etching to create micromachined apertures in a silicon wafer. In order to provide surface properties for lipid bilayer attachment that are similar to those of the fluorocarbon films that are currently used, we coated the silicon surface with a fluoropolymer using plasma-assisted chemical vapor deposition. When compared with the surface treatment methods using self-assembled monolayers of fluorocarbon chemicals, this novel approach towards modifying the wettability of a silicon dioxide surface provides an easy and fast method for subsequent lipid bilayer formation. Current-Voltage measurements on OmpF ion channels incorporated into these membranes show the voltage dependent gating action expected from a working porin ion channel.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium Proceedings
EditorsJ. Liu, D. McIlroy, L. Merhari, J.P. Pendry, J.T. Borenstein, P. Grodzinski, L.P. Lee, Z.L. Wang
Pages163-170
Number of pages8
Volume820
StatePublished - 2004
EventNanoengineered Assemblies and Advanced Micro/Nanosystems - San Francisco, CA, United States
Duration: Apr 13 2004Apr 16 2004

Other

OtherNanoengineered Assemblies and Advanced Micro/Nanosystems
CountryUnited States
CitySan Francisco, CA
Period4/13/044/16/04

Fingerprint

Lipid bilayers
Silicon
Ion Channels
Fluorocarbons
Sensors
Ions
Fluorine containing polymers
Porins
Voltage measurement
Reactive ion etching
Self assembled monolayers
Photolithography
Electric current measurement
Silicon wafers
Biosensors
Silicon Dioxide
Surface properties
Wetting
Surface treatment
Chemical vapor deposition

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Goryll, M., Wilk, S., Laws, G. M., Goodnick, S., Thornton, T., Saraniti, M., ... Eisenberg, R. S. (2004). Ion channel sensor on a silicon support. In J. Liu, D. McIlroy, L. Merhari, J. P. Pendry, J. T. Borenstein, P. Grodzinski, L. P. Lee, ... Z. L. Wang (Eds.), Materials Research Society Symposium Proceedings (Vol. 820, pp. 163-170). [O7.2]

Ion channel sensor on a silicon support. / Goryll, Michael; Wilk, Seth; Laws, Gerard M.; Goodnick, Stephen; Thornton, Trevor; Saraniti, Marco; Tang, John M.; Eisenberg, Robert S.

Materials Research Society Symposium Proceedings. ed. / J. Liu; D. McIlroy; L. Merhari; J.P. Pendry; J.T. Borenstein; P. Grodzinski; L.P. Lee; Z.L. Wang. Vol. 820 2004. p. 163-170 O7.2.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Goryll, M, Wilk, S, Laws, GM, Goodnick, S, Thornton, T, Saraniti, M, Tang, JM & Eisenberg, RS 2004, Ion channel sensor on a silicon support. in J Liu, D McIlroy, L Merhari, JP Pendry, JT Borenstein, P Grodzinski, LP Lee & ZL Wang (eds), Materials Research Society Symposium Proceedings. vol. 820, O7.2, pp. 163-170, Nanoengineered Assemblies and Advanced Micro/Nanosystems, San Francisco, CA, United States, 4/13/04.
Goryll M, Wilk S, Laws GM, Goodnick S, Thornton T, Saraniti M et al. Ion channel sensor on a silicon support. In Liu J, McIlroy D, Merhari L, Pendry JP, Borenstein JT, Grodzinski P, Lee LP, Wang ZL, editors, Materials Research Society Symposium Proceedings. Vol. 820. 2004. p. 163-170. O7.2
Goryll, Michael ; Wilk, Seth ; Laws, Gerard M. ; Goodnick, Stephen ; Thornton, Trevor ; Saraniti, Marco ; Tang, John M. ; Eisenberg, Robert S. / Ion channel sensor on a silicon support. Materials Research Society Symposium Proceedings. editor / J. Liu ; D. McIlroy ; L. Merhari ; J.P. Pendry ; J.T. Borenstein ; P. Grodzinski ; L.P. Lee ; Z.L. Wang. Vol. 820 2004. pp. 163-170
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