Ion beam analysis of silicon-based surfaces and correlation with surface energy measurements

Qian Xing, N. Herbots, M. Hart, J. D. Bradley, B. J. Wilkens, D. A. Sell, Clive H. Sell, Henry Mark Kwong, Robert Culbertson, S. D. Whaley

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

The water affinity of Si-based surfaces is quantified by contact angle measurement and surface free energy to explain hydrophobic or hydrophilic behavior of silicone, silicates, and silicon surfaces. Surface defects such as dangling bonds, surface free energy including Lewis acid-base and Lifshitz-van der Waals components are discussed. Water nucleation and condensation is further explained by surface topography. Tapping mode atomic force microscopy (TMAFM) provides statistical analysis of the topography of these Si-based surfaces. The correlation of the above two characteristics describes the behavior of water condensation at Si-based surfaces. Surface root mean square roughness increasing from several Å to several nm is found to provide nucleation sites that expedite water condensation visibly for silica and silicone. Hydrophilic surfaces have a condensation pattern that forms puddles of water while hydrophobic surfaces form water beads. Polymer adsorption on these surfaces alters the water affinity as well as the surface topography, and therefore controls condensation on Si-based surfaces including silicone intraocular lens (IOL). The polymer film is characterized by Rutherford backscattering spectrometry (RBS) in conjunction with 4.265 MeV 12C(α, α)12C, 3.045 MeV 16O(α, α)16O nuclear resonance scattering (NRS), and 2.8 MeV elastic recoil detection (ERD) of hydrogen for high resolution composition and areal density measurements. The areal density of hydroxypropyl methylcellulose (HPMC) film ranges from 10 18 atom/cm2 to 1019 atom/cm2 gives the silica or silicone surface a roughness of several Å and a wavelength of 0.16 ± 0.02 μm, and prevents fogging by forming a complete wetting layer during water condensation.

Original languageEnglish (US)
Title of host publicationApplication of Accelerators in Research and Industry - Twenty-First International Conference, CAARI 2010
Pages201-207
Number of pages7
DOIs
StatePublished - Jul 14 2011
Event21st International Conference on Application of Accelerators in Research and Industry, CAARI 2010 - Fort Worth, TX, United States
Duration: Aug 8 2010Aug 13 2010

Publication series

NameAIP Conference Proceedings
Volume1336
ISSN (Print)0094-243X
ISSN (Electronic)1551-7616

Other

Other21st International Conference on Application of Accelerators in Research and Industry, CAARI 2010
CountryUnited States
CityFort Worth, TX
Period8/8/108/13/10

Keywords

  • AFM
  • Contact angle
  • ERD
  • Intraocular implant
  • NRS
  • Polymer film
  • RBS
  • Si(100)
  • Silica
  • Silicone
  • Surface free energy
  • Surface topography

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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