Investigations of microstructure of thin TbFeCo films by high-resolution electron microscopy

Z. G. Li, David Smith, E. E. Marinero, J. A. Willett

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

High-resolution electron microscope observations confirm the presence of small crystallites in thin TbFeCo films protected by Si3N4 overcoats. Selected area electron diffraction patterns in top-view projection indicate that the crystals have a face-centered-cubic structure. Microscope analysis reveals grain growth following annealing of these protected thin films at 200°C in vacuum, and Kerr measurements yield large reductions in coercivity relative to the room-temperature value. The typical grain size visible in top-view observations increases from about 3 nm in the as-deposited samples to about 30 nm after annealing at 200°C for 36 h while the static coercivity, Hc, drops by about 40%. The fcc structure of the crystals is retained after annealing.

Original languageEnglish (US)
Pages (from-to)6590-6594
Number of pages5
JournalJournal of Applied Physics
Volume69
Issue number9
DOIs
StatePublished - 1991

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electron microscopy
microstructure
annealing
coercivity
high resolution
thin films
crystallites
crystals
diffraction patterns
electron diffraction
electron microscopes
grain size
projection
microscopes
vacuum
room temperature

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Investigations of microstructure of thin TbFeCo films by high-resolution electron microscopy. / Li, Z. G.; Smith, David; Marinero, E. E.; Willett, J. A.

In: Journal of Applied Physics, Vol. 69, No. 9, 1991, p. 6590-6594.

Research output: Contribution to journalArticle

Li, Z. G. ; Smith, David ; Marinero, E. E. ; Willett, J. A. / Investigations of microstructure of thin TbFeCo films by high-resolution electron microscopy. In: Journal of Applied Physics. 1991 ; Vol. 69, No. 9. pp. 6590-6594.
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