Investigation of titanium silicon and germanium reaction

D. B. Aldrich, D. E. Sayers, R. J. Nemanich

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Scopus citations

Abstract

It has been shown that, across the full range of Si-Ge alloy compositions, C54 Ti(SiyGe1-y)2 will form from the reaction of Ti with SixGe1-x (0≤x≤1.00).X-ray Absorption Fine Structure (XAFS) and X-Ray Diffraction (EXRD) have been used to define consistent labeling of the C54 lattice parameters. In C54 Ti(SiyGe1-y)2 the Si and Ge atoms occupy sites equivalent to the Si sites in C54 TiSi2. The Si and Ge atoms form shells about the Ti atoms that, within error, have Si and Ge occupancies consistent with the net Si and Ge atomic percents as determine by Auger microprobe depth profiled compositional analysis. There is an increase in the Si/Ge ratio (i.e., y > x) in the Titanium Germanosilicide. This increase may be due, in part, to the relative diffusion rates of Si, Ge, and Ti. The morphologies of the reacted films can be divided into three groups based on their similarity to the morphologies of C54 TiSi2 and C54 TiGe2 formed from similar solid phase reactions. The morphological groupings indicate that the morphology of the final C54 phase (and probably the reaction path) is strongly related to the Si/Ge content of the film.

Original languageEnglish (US)
Title of host publicationEvolution of Surface and Thin Film Microstructure
EditorsHarry A. Atwater, Eric Chason, Marcia H. Grabow, Max G. Lagally
PublisherPubl by Materials Research Society
Pages585-588
Number of pages4
ISBN (Print)1558991751
StatePublished - Dec 1 1993
Externally publishedYes
EventProceedings of the 1992 Fall Meeting of the Materials Research Society - Boston, MA, USA
Duration: Nov 30 1992Dec 4 1992

Publication series

NameMaterials Research Society Symposium Proceedings
Volume280
ISSN (Print)0272-9172

Other

OtherProceedings of the 1992 Fall Meeting of the Materials Research Society
CityBoston, MA, USA
Period11/30/9212/4/92

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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  • Cite this

    Aldrich, D. B., Sayers, D. E., & Nemanich, R. J. (1993). Investigation of titanium silicon and germanium reaction. In H. A. Atwater, E. Chason, M. H. Grabow, & M. G. Lagally (Eds.), Evolution of Surface and Thin Film Microstructure (pp. 585-588). (Materials Research Society Symposium Proceedings; Vol. 280). Publ by Materials Research Society.