Investigation of chromium nitridation using ion beam resonance analysis

S. W. Russell, A. E. Bair, M. J. Rack, D. Adams, R. L. Spreitzer, Terry Alford, Robert Culbertson

Research output: Chapter in Book/Report/Conference proceedingConference contribution

2 Citations (Scopus)

Abstract

We investigate the nitridation of chromium films in an NH 3 ambient at 500°C. Rutherford backscattering spectrometry using 2.0 MeV He 2+ was utilized to determine the compositions of thick reacted layers and to provide calibration for the other techniques. In addition, analysis was performed using the 14N(α,α) 14N resonance at 3.72 MeV in order to enhance sensitivity to nitrogen. Sputter-deposited TiN was used as a calibration for the cross section σ for this resonance over the energy range 3.05-3.85 MeV and compared to the literature value. We find that analysis just above the peak in the resonance provides excellent sensitivity to N concentration in the nitride layers. This approach may be readily used in conjunction with 2.0 MeV backscattering to determine the overall composition and sample configuration. Auger electron spectroscopy was used to provide more depth sensitivity in compositional profiling and to monitor the oxygen impurity distribution. X-ray diffraction was used to identify phases in both as-deposited and annealed films.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
PublisherMaterials Research Society
Pages619-624
Number of pages6
Volume337
StatePublished - 1994
EventProceedings of the 1994 MRS Spring Meeting - San Francisco, CA, USA
Duration: Apr 4 1994Apr 8 1994

Other

OtherProceedings of the 1994 MRS Spring Meeting
CitySan Francisco, CA, USA
Period4/4/944/8/94

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Nitridation
Chromium
Ion beams
Calibration
Rutherford backscattering spectroscopy
Auger electron spectroscopy
Backscattering
Chemical analysis
Nitrides
Spectrometry
Nitrogen
Impurities
Oxygen
X ray diffraction

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Russell, S. W., Bair, A. E., Rack, M. J., Adams, D., Spreitzer, R. L., Alford, T., & Culbertson, R. (1994). Investigation of chromium nitridation using ion beam resonance analysis. In Materials Research Society Symposium - Proceedings (Vol. 337, pp. 619-624). Materials Research Society.

Investigation of chromium nitridation using ion beam resonance analysis. / Russell, S. W.; Bair, A. E.; Rack, M. J.; Adams, D.; Spreitzer, R. L.; Alford, Terry; Culbertson, Robert.

Materials Research Society Symposium - Proceedings. Vol. 337 Materials Research Society, 1994. p. 619-624.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Russell, SW, Bair, AE, Rack, MJ, Adams, D, Spreitzer, RL, Alford, T & Culbertson, R 1994, Investigation of chromium nitridation using ion beam resonance analysis. in Materials Research Society Symposium - Proceedings. vol. 337, Materials Research Society, pp. 619-624, Proceedings of the 1994 MRS Spring Meeting, San Francisco, CA, USA, 4/4/94.
Russell SW, Bair AE, Rack MJ, Adams D, Spreitzer RL, Alford T et al. Investigation of chromium nitridation using ion beam resonance analysis. In Materials Research Society Symposium - Proceedings. Vol. 337. Materials Research Society. 1994. p. 619-624
Russell, S. W. ; Bair, A. E. ; Rack, M. J. ; Adams, D. ; Spreitzer, R. L. ; Alford, Terry ; Culbertson, Robert. / Investigation of chromium nitridation using ion beam resonance analysis. Materials Research Society Symposium - Proceedings. Vol. 337 Materials Research Society, 1994. pp. 619-624
@inproceedings{47c7bcbd62d34a2995fc3b148859bff4,
title = "Investigation of chromium nitridation using ion beam resonance analysis",
abstract = "We investigate the nitridation of chromium films in an NH 3 ambient at 500°C. Rutherford backscattering spectrometry using 2.0 MeV He 2+ was utilized to determine the compositions of thick reacted layers and to provide calibration for the other techniques. In addition, analysis was performed using the 14N(α,α) 14N resonance at 3.72 MeV in order to enhance sensitivity to nitrogen. Sputter-deposited TiN was used as a calibration for the cross section σ for this resonance over the energy range 3.05-3.85 MeV and compared to the literature value. We find that analysis just above the peak in the resonance provides excellent sensitivity to N concentration in the nitride layers. This approach may be readily used in conjunction with 2.0 MeV backscattering to determine the overall composition and sample configuration. Auger electron spectroscopy was used to provide more depth sensitivity in compositional profiling and to monitor the oxygen impurity distribution. X-ray diffraction was used to identify phases in both as-deposited and annealed films.",
author = "Russell, {S. W.} and Bair, {A. E.} and Rack, {M. J.} and D. Adams and Spreitzer, {R. L.} and Terry Alford and Robert Culbertson",
year = "1994",
language = "English (US)",
volume = "337",
pages = "619--624",
booktitle = "Materials Research Society Symposium - Proceedings",
publisher = "Materials Research Society",

}

TY - GEN

T1 - Investigation of chromium nitridation using ion beam resonance analysis

AU - Russell, S. W.

AU - Bair, A. E.

AU - Rack, M. J.

AU - Adams, D.

AU - Spreitzer, R. L.

AU - Alford, Terry

AU - Culbertson, Robert

PY - 1994

Y1 - 1994

N2 - We investigate the nitridation of chromium films in an NH 3 ambient at 500°C. Rutherford backscattering spectrometry using 2.0 MeV He 2+ was utilized to determine the compositions of thick reacted layers and to provide calibration for the other techniques. In addition, analysis was performed using the 14N(α,α) 14N resonance at 3.72 MeV in order to enhance sensitivity to nitrogen. Sputter-deposited TiN was used as a calibration for the cross section σ for this resonance over the energy range 3.05-3.85 MeV and compared to the literature value. We find that analysis just above the peak in the resonance provides excellent sensitivity to N concentration in the nitride layers. This approach may be readily used in conjunction with 2.0 MeV backscattering to determine the overall composition and sample configuration. Auger electron spectroscopy was used to provide more depth sensitivity in compositional profiling and to monitor the oxygen impurity distribution. X-ray diffraction was used to identify phases in both as-deposited and annealed films.

AB - We investigate the nitridation of chromium films in an NH 3 ambient at 500°C. Rutherford backscattering spectrometry using 2.0 MeV He 2+ was utilized to determine the compositions of thick reacted layers and to provide calibration for the other techniques. In addition, analysis was performed using the 14N(α,α) 14N resonance at 3.72 MeV in order to enhance sensitivity to nitrogen. Sputter-deposited TiN was used as a calibration for the cross section σ for this resonance over the energy range 3.05-3.85 MeV and compared to the literature value. We find that analysis just above the peak in the resonance provides excellent sensitivity to N concentration in the nitride layers. This approach may be readily used in conjunction with 2.0 MeV backscattering to determine the overall composition and sample configuration. Auger electron spectroscopy was used to provide more depth sensitivity in compositional profiling and to monitor the oxygen impurity distribution. X-ray diffraction was used to identify phases in both as-deposited and annealed films.

UR - http://www.scopus.com/inward/record.url?scp=0028594285&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0028594285&partnerID=8YFLogxK

M3 - Conference contribution

VL - 337

SP - 619

EP - 624

BT - Materials Research Society Symposium - Proceedings

PB - Materials Research Society

ER -