Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films

V. A. Burrows

Research output: Contribution to journalArticle

5 Scopus citations

Abstract

Infrared (i.r.) spectroscopy can provide useful chemical information about species present at semiconductor surfaces, at interfaces, and in thin films. Though inherently less sensitive than electron-based techniques, i.r. spectroscopic sensitivity can be greatly enhanced through application of multiple internal reflection geometry. Basic theory describing internal reflection techniques is presented, followed by a discussion of options for apparatus and optics. Finally, examples from the recent literature will be discussed.

Original languageEnglish (US)
Pages (from-to)231-238
Number of pages8
JournalSolid State Electronics
Volume35
Issue number3
DOIs
StatePublished - Mar 1992

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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