Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films

V. A. Burrows

doi:10.1016/0038-1101(92)90227-4

Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films

V. A. Burrows

Chemical Engineering

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Infrared (i.r.) spectroscopy can provide useful chemical information about species present at semiconductor surfaces, at interfaces, and in thin films. Though inherently less sensitive than electron-based techniques, i.r. spectroscopic sensitivity can be greatly enhanced through application of multiple internal reflection geometry. Basic theory describing internal reflection techniques is presented, followed by a discussion of options for apparatus and optics. Finally, examples from the recent literature will be discussed.

Original language	English (US)
Pages (from-to)	231-238
Number of pages	8
Journal	Solid State Electronics
Volume	35
Issue number	3
DOIs	https://doi.org/10.1016/0038-1101(92)90227-4
State	Published - Mar 1992

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics
Electrical and Electronic Engineering
Materials Chemistry

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10.1016/0038-1101(92)90227-4

Cite this

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title = "Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films",

abstract = "Infrared (i.r.) spectroscopy can provide useful chemical information about species present at semiconductor surfaces, at interfaces, and in thin films. Though inherently less sensitive than electron-based techniques, i.r. spectroscopic sensitivity can be greatly enhanced through application of multiple internal reflection geometry. Basic theory describing internal reflection techniques is presented, followed by a discussion of options for apparatus and optics. Finally, examples from the recent literature will be discussed.",

author = "Burrows, {V. A.}",

year = "1992",

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doi = "10.1016/0038-1101(92)90227-4",

language = "English (US)",

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Y1 - 1992/3

N2 - Infrared (i.r.) spectroscopy can provide useful chemical information about species present at semiconductor surfaces, at interfaces, and in thin films. Though inherently less sensitive than electron-based techniques, i.r. spectroscopic sensitivity can be greatly enhanced through application of multiple internal reflection geometry. Basic theory describing internal reflection techniques is presented, followed by a discussion of options for apparatus and optics. Finally, examples from the recent literature will be discussed.

AB - Infrared (i.r.) spectroscopy can provide useful chemical information about species present at semiconductor surfaces, at interfaces, and in thin films. Though inherently less sensitive than electron-based techniques, i.r. spectroscopic sensitivity can be greatly enhanced through application of multiple internal reflection geometry. Basic theory describing internal reflection techniques is presented, followed by a discussion of options for apparatus and optics. Finally, examples from the recent literature will be discussed.

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DO - 10.1016/0038-1101(92)90227-4

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SP - 231

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JO - Solid-State Electronics

JF - Solid-State Electronics

IS - 3

ER -

Internal reflection infrared spectroscopy for chemical analysis of surfaces and thin films

Abstract

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