Interfacial structure in silicon nitride sintered with lanthanide oxide

C. Dwyer, A. Ziegler, N. Shibata, G. B. Winkelman, R. L. Satet, M. J. Hoffmann, M. K. Cinibulk, P. F. Becher, G. S. Painter, N. D. Browning, D. J.H. Cockayne, R. O. Ritchie, S. J. Pennycook

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Abstract

Three independent research groups present a comparison of their structural analyses of prismatic interfaces in silicon nitride densified with the aid of lanthanide oxide Ln2O3. All three groups obtained scanning transmission electron microscope images which clearly reveal the presence of well-defined Ln segregation sites at the interfaces, and, moreover, reveal that these segregation sites are element-specific. While some results differ across the three research groups, the vast majority exhibits good reproducibility.

Original languageEnglish (US)
Pages (from-to)4405-4412
Number of pages8
JournalJournal of Materials Science
Volume41
Issue number14
DOIs
StatePublished - Jul 1 2006

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ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Dwyer, C., Ziegler, A., Shibata, N., Winkelman, G. B., Satet, R. L., Hoffmann, M. J., Cinibulk, M. K., Becher, P. F., Painter, G. S., Browning, N. D., Cockayne, D. J. H., Ritchie, R. O., & Pennycook, S. J. (2006). Interfacial structure in silicon nitride sintered with lanthanide oxide. Journal of Materials Science, 41(14), 4405-4412. https://doi.org/10.1007/s10853-006-0152-2