Interface instabilities and electronic properties of ZrO 2 on silicon (100)

C. C. Fulton, T. E. Cook, G. Lucovsky, R. J. Nemanich

Research output: Contribution to journalArticlepeer-review

35 Scopus citations


The interface stability of Zr-based high-k dielectrics with an oxide buffer layer was studied using x-ray and ultraviolet photoemission spectroscopy. The Zirconium oxide films were characterized in situ in a stepwise sequence in order to explore their chemical stability and electronic properties as a function of film thickness and processing conditions. The buffer layers were found to serve to lower the interface state density and to address the high temperature instabilities of ZrO 2 in direct contact with Si. It was proposed that the As grown films contain excess oxygen resulting in a charge transfer from the Si substrate to the internal (ZrO 2SiO 2) interface.

Original languageEnglish (US)
Pages (from-to)2665-2673
Number of pages9
JournalJournal of Applied Physics
Issue number5
StatePublished - Sep 1 2004
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)


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