Interaction of water with silicon dioxide at low temperature relevant to CMP

Scott A. Gold, Veronica Burrows

Research output: Contribution to journalArticle

4 Scopus citations

Abstract

The reaction of water with silicon dioxide to form silanol species has been proposed to be a major component of the silicon dioxide chemical mechanical penalization (CMP) mechanism. Internal-reflection infrared spectroscopy was used to examine this reaction at low temperatures relevant to CMP of silicon dioxide thin films during integrated circuit manufacture (20-80°C). No significant reaction was observed at 20°C; some silanol formation was observed at 80°C with long exposure times. Molecular water was the predominant hydrous species observed at 80°C indicating that silanol formation does not contribute as significantly to the CMP removal process as previously thought.

Original languageEnglish (US)
Article number4
JournalElectrochemical and Solid-State Letters
Volume7
Issue number12
DOIs
Publication statusPublished - 2004

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ASJC Scopus subject areas

  • Electrochemistry
  • Materials Science(all)

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