Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

S. P. Hau-Riege, R. A. London, A. Graf, S. L. Baker, R. Soufli, R. Sobierajski, T. Burian, J. Chalupsky, L. Juha, J. Gaudin, J. Krzywinski, S. Moeller, M. Messerschmidt, J. Bozek, C. Bostedt

Research output: Contribution to journalArticle

32 Scopus citations

Abstract

Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.

Original languageEnglish (US)
Pages (from-to)23933-23938
Number of pages6
JournalOptics Express
Volume18
Issue number23
DOIs
StatePublished - Nov 8 2010

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Fingerprint Dive into the research topics of 'Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser'. Together they form a unique fingerprint.

  • Cite this

    Hau-Riege, S. P., London, R. A., Graf, A., Baker, S. L., Soufli, R., Sobierajski, R., Burian, T., Chalupsky, J., Juha, L., Gaudin, J., Krzywinski, J., Moeller, S., Messerschmidt, M., Bozek, J., & Bostedt, C. (2010). Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser. Optics Express, 18(23), 23933-23938. https://doi.org/10.1364/OE.18.023933