Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

S. P. Hau-Riege; R. A. London; A. Graf; S. L. Baker; R. Soufli; R. Sobierajski; T. Burian; J. Chalupsky; L. Juha; J. Gaudin; J. Krzywinski; S. Moeller; M. Messerschmidt; J. Bozek; C. Bostedt

doi:10.1364/OE.18.023933

Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

S. P. Hau-Riege, R. A. London, A. Graf, S. L. Baker, R. Soufli, R. Sobierajski, T. Burian, J. Chalupsky, L. Juha, J. Gaudin, J. Krzywinski, S. Moeller, M. Messerschmidt, J. Bozek, C. Bostedt

Research output: Contribution to journal › Article › peer-review

38 Scopus citations

Abstract

Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.

Original language	English (US)
Pages (from-to)	23933-23938
Number of pages	6
Journal	Optics Express
Volume	18
Issue number	23
DOIs	https://doi.org/10.1364/OE.18.023933
State	Published - Nov 8 2010
Externally published	Yes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics

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Hau-Riege, S. P., London, R. A., Graf, A., Baker, S. L., Soufli, R., Sobierajski, R., Burian, T., Chalupsky, J., Juha, L., Gaudin, J., Krzywinski, J., Moeller, S., Messerschmidt, M., Bozek, J., & Bostedt, C. (2010). Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser. Optics Express, 18(23), 23933-23938. https://doi.org/10.1364/OE.18.023933

Hau-Riege, SP, London, RA, Graf, A, Baker, SL, Soufli, R, Sobierajski, R, Burian, T, Chalupsky, J, Juha, L, Gaudin, J, Krzywinski, J, Moeller, S, Messerschmidt, M, Bozek, J & Bostedt, C 2010, 'Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser', Optics Express, vol. 18, no. 23, pp. 23933-23938. https://doi.org/10.1364/OE.18.023933

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title = "Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser",

abstract = "Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.",

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AU - Hau-Riege, S. P.

AU - London, R. A.

AU - Graf, A.

AU - Baker, S. L.

AU - Soufli, R.

AU - Sobierajski, R.

AU - Burian, T.

AU - Chalupsky, J.

AU - Juha, L.

AU - Gaudin, J.

AU - Krzywinski, J.

AU - Moeller, S.

AU - Messerschmidt, M.

AU - Bozek, J.

AU - Bostedt, C.

PY - 2010/11/8

Y1 - 2010/11/8

N2 - Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.

AB - Materials used for hard x-ray-free-electron laser (XFEL) optics must withstand high-intensity x-ray pulses. The advent of the Linac Coherent Light Source has enabled us to expose candidate optical materials, such as bulk B4C and SiC films, to 0.83 keV XFEL pulses with pulse energies between 1 μJ and 2 mJ to determine short-pulse hard x-ray damage thresholds. The fluence required for the onset of damage for single pulses is around the melt fluence and slightly lower for multiple pulses. We observed strong mechanical cracking in the materials, which may be due to the larger penetration depths of the hard x-rays.

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Interaction of short x-ray pulses with low-Z x-ray optics materials at the LCLS free-electron laser

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