Integration of metallic nanostructures in fluidic channels for fluorescence and Raman enhancement by nanoimprint lithography and lift-off on compositional resist stack

Chao Wang, Stephen Y. Chou

Research output: Contribution to journalArticle

6 Scopus citations

Abstract

We present and demonstrate a novel fabrication method to integrate metallic nanostructures into fluidic systems, using nanoimprint lithography and lift-off on a compositional resist stack, which consists of multi-layers of SiO 2 and polymer patterned from different fabrication steps. The lift-off of the stack allows the final nano-features precisely aligned in the proper locations inside fluidic channels. The method provides high-throughput low-cost patterning and compatibility with various fluidic channel designs, and will be useful for fluorescence and Raman scattering enhancement in nano-fluidic systems.

Original languageEnglish (US)
Pages (from-to)693-697
Number of pages5
JournalMicroelectronic Engineering
Volume98
DOIs
StatePublished - Oct 1 2012
Externally publishedYes

Keywords

  • Aligned patterning
  • Compositional resist stack
  • Fluidic channel
  • Fluorescence and Raman scattering
  • Metallic nanostructures
  • Nanoimprint lithography

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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