Abstract

A series of pyrite thin films were deposited in-situ in a monolayer-by-monolayer fashion using sequential evaporation of iron under high vacuum, followed by sulfidation at a sulfur pressure of 133 Pa, as a function of substrate temperature. The stoichiometry, crystallinity, topographic smoothness, and phase purity of the deposited pyrite thin films improve with increasing substrate temperature up to 420 °C, the highest temperature studied. Characterization of the films deposited at 420 °C using selected-area precession electron diffraction, Raman Spectroscopy, and conventional X-ray diffraction indicated that the pyrite layer is phase pure, with no evidence of a secondary marcasite phase, and grew in columnar grains with a preferential (100) orientation on the (100) silicon substrates. This novel sequential evaporation technique has the potential to make useful low-cost semiconducting pyrite materials for large-area electronic applications.

LanguageEnglish (US)
Pages49-55
Number of pages7
JournalThin Solid Films
Volume669
DOIs
StatePublished - Jan 1 2019

Fingerprint

Pyrites
pyrites
Thin films
Substrates
thin films
Monolayers
Evaporation
evaporation
sulfidation
Temperature
temperature
Silicon
high vacuum
precession
Sulfur
Electron diffraction
Stoichiometry
Raman spectroscopy
stoichiometry
crystallinity

Keywords

  • Electronic material
  • Large area deposits
  • Photovoltaic material
  • Physical vapor deposition
  • Semiconducting iron pyrite
  • Sequential vapor deposition
  • Thin film growth

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

Cite this

Influence of substrate temperature on properties of pyrite thin films deposited using a sequential coevaporation technique. / Walimbe, A.; Wertheim, A.; Ravi, A.; Kopas, Cameron; Saxena, A.; Singh, Rakesh; Lehner, S. W.; Domenico, John; Makar, James; Carpenter, R. W.; Buseck, P R; Newman, Nathan.

In: Thin Solid Films, Vol. 669, 01.01.2019, p. 49-55.

Research output: Contribution to journalArticle

Walimbe, A. ; Wertheim, A. ; Ravi, A. ; Kopas, Cameron ; Saxena, A. ; Singh, Rakesh ; Lehner, S. W. ; Domenico, John ; Makar, James ; Carpenter, R. W. ; Buseck, P R ; Newman, Nathan. / Influence of substrate temperature on properties of pyrite thin films deposited using a sequential coevaporation technique. In: Thin Solid Films. 2019 ; Vol. 669. pp. 49-55.
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AU - Domenico, John

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