Influence of strain, surface diffusion and Ostwald ripening on the evolution of nanostructures for erbium on Si(001)

Lena Fitting; M. C. Zeman; W. C. Yang; R. J. Nemanich

doi:10.1063/1.1557787

Influence of strain, surface diffusion and Ostwald ripening on the evolution of nanostructures for erbium on Si(001)

Lena Fitting, M. C. Zeman, W. C. Yang, R. J. Nemanich

Research output: Contribution to journal › Article › peer-review

20 Scopus citations

Abstract

Influence of strain, surface diffusion and Ostwald ripening on the evolution of nanostructures for erbium on Si(001) was discussed. Ultraviolet photoelectron emission microscopy was employed to study the real time growth process of individual erbium silicide nanostructures on Si(001) surfaces at temperatures up to 1050 °C. A temperature regime was indicated by the results obtained where island growth is mainly governed by surface diffusion of the deposited Er adatoms and a higher temperature regime where Ostwald ripening contributes to the island morphology.

Original language	English (US)
Pages (from-to)	4180-4184
Number of pages	5
Journal	Journal of Applied Physics
Volume	93
Issue number	7
DOIs	https://doi.org/10.1063/1.1557787
State	Published - Apr 1 2003
Externally published	Yes

ASJC Scopus subject areas

General Physics and Astronomy

Access to Document

10.1063/1.1557787

Cite this

@article{90f67f7bc02a4a968ba7012c90d73d1a,

title = "Influence of strain, surface diffusion and Ostwald ripening on the evolution of nanostructures for erbium on Si(001)",

abstract = "Influence of strain, surface diffusion and Ostwald ripening on the evolution of nanostructures for erbium on Si(001) was discussed. Ultraviolet photoelectron emission microscopy was employed to study the real time growth process of individual erbium silicide nanostructures on Si(001) surfaces at temperatures up to 1050 °C. A temperature regime was indicated by the results obtained where island growth is mainly governed by surface diffusion of the deposited Er adatoms and a higher temperature regime where Ostwald ripening contributes to the island morphology.",

author = "Lena Fitting and Zeman, {M. C.} and Yang, {W. C.} and Nemanich, {R. J.}",

year = "2003",

month = apr,

day = "1",

doi = "10.1063/1.1557787",

language = "English (US)",

volume = "93",

pages = "4180--4184",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics Publising LLC",

number = "7",

}

TY - JOUR

T1 - Influence of strain, surface diffusion and Ostwald ripening on the evolution of nanostructures for erbium on Si(001)

AU - Fitting, Lena

AU - Zeman, M. C.

AU - Yang, W. C.

AU - Nemanich, R. J.

PY - 2003/4/1

Y1 - 2003/4/1

N2 - Influence of strain, surface diffusion and Ostwald ripening on the evolution of nanostructures for erbium on Si(001) was discussed. Ultraviolet photoelectron emission microscopy was employed to study the real time growth process of individual erbium silicide nanostructures on Si(001) surfaces at temperatures up to 1050 °C. A temperature regime was indicated by the results obtained where island growth is mainly governed by surface diffusion of the deposited Er adatoms and a higher temperature regime where Ostwald ripening contributes to the island morphology.

AB - Influence of strain, surface diffusion and Ostwald ripening on the evolution of nanostructures for erbium on Si(001) was discussed. Ultraviolet photoelectron emission microscopy was employed to study the real time growth process of individual erbium silicide nanostructures on Si(001) surfaces at temperatures up to 1050 °C. A temperature regime was indicated by the results obtained where island growth is mainly governed by surface diffusion of the deposited Er adatoms and a higher temperature regime where Ostwald ripening contributes to the island morphology.

UR - http://www.scopus.com/inward/record.url?scp=0037390730&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0037390730&partnerID=8YFLogxK

U2 - 10.1063/1.1557787

DO - 10.1063/1.1557787

M3 - Article

AN - SCOPUS:0037390730

SN - 0021-8979

VL - 93

SP - 4180

EP - 4184

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 7

ER -

Influence of strain, surface diffusion and Ostwald ripening on the evolution of nanostructures for erbium on Si(001)

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this