Abstract
We report on the reduction of defect densities in non-polar a-plane GaN films over r-plane sapphire achieved by epitaxial laterally overgrowth (ELOG) approach. A mask pattern was used to produce ELOG GaN with wing region width of about 30μm. Based on transmission electron microscopy (TEM) results, the window regions have stacking faults density of ∼10 6cm -1 and threading dislocation density of ∼10 10cm -2. Both ELOG Ga-face and N-face wing regions have stacking fault density of ∼10 5 cm -1, and dislocation density less than 10 8 cm -2. Cathodoluminescence studies reveal the difference in defect densities between N-faced and Ga-faced wings. GaN-based UV light-emitting diode formed on Ga-faced wing shows stronger quantum well emission and weaker parasitic emission than that formed on N-faced wing.
Original language | English (US) |
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Title of host publication | Physica Status Solidi C: Conferences |
Pages | 2732-2735 |
Number of pages | 4 |
Volume | 2 |
Edition | 7 |
DOIs | |
State | Published - 2005 |
ASJC Scopus subject areas
- Condensed Matter Physics