Increasing throughput in low pressure chemical vapor deposition: an optimal control approach

Timothy S. Cale, Peter E. Crouch, Lijuan Song, Konstantinos Tsakalis

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

The application of optimal control theory to the process of low pressure chemical vapor deposition on patterned surfaces can substantially decrease the processing time for a given step coverage, compared with the programmed rate chemical vapor deposition (PRCVD) process. The control model is developed from the simultaneous one-dimensional Knudsen diffusion and chemical reaction description. For such a model, the optimal control problem is formulated as to find a temperature trajectory yielding the minimum processing time and its solution is computed numerically via a modified variation of extremals method. For the thermally activated deposition of silicon dioxide from tetraethylorthosilicate (TEOS) and for a ninety-six percent step coverage, the optimal control-generated temperature trajectory results in time-savings of approximately twenty-eight percent, when compared to the PRCVD approach.

Original languageEnglish (US)
Title of host publicationProceedings of the American Control Conference
Pages1289-1293
Number of pages5
Volume2
StatePublished - 1995
EventProceedings of the 1995 American Control Conference. Part 1 (of 6) - Seattle, WA, USA
Duration: Jun 21 1995Jun 23 1995

Other

OtherProceedings of the 1995 American Control Conference. Part 1 (of 6)
CitySeattle, WA, USA
Period6/21/956/23/95

Fingerprint

Low pressure chemical vapor deposition
Throughput
Chemical vapor deposition
Trajectories
Processing
Control theory
Chemical reactions
Silica
Temperature

ASJC Scopus subject areas

  • Control and Systems Engineering

Cite this

Cale, T. S., Crouch, P. E., Song, L., & Tsakalis, K. (1995). Increasing throughput in low pressure chemical vapor deposition: an optimal control approach. In Proceedings of the American Control Conference (Vol. 2, pp. 1289-1293)

Increasing throughput in low pressure chemical vapor deposition : an optimal control approach. / Cale, Timothy S.; Crouch, Peter E.; Song, Lijuan; Tsakalis, Konstantinos.

Proceedings of the American Control Conference. Vol. 2 1995. p. 1289-1293.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Cale, TS, Crouch, PE, Song, L & Tsakalis, K 1995, Increasing throughput in low pressure chemical vapor deposition: an optimal control approach. in Proceedings of the American Control Conference. vol. 2, pp. 1289-1293, Proceedings of the 1995 American Control Conference. Part 1 (of 6), Seattle, WA, USA, 6/21/95.
Cale TS, Crouch PE, Song L, Tsakalis K. Increasing throughput in low pressure chemical vapor deposition: an optimal control approach. In Proceedings of the American Control Conference. Vol. 2. 1995. p. 1289-1293
Cale, Timothy S. ; Crouch, Peter E. ; Song, Lijuan ; Tsakalis, Konstantinos. / Increasing throughput in low pressure chemical vapor deposition : an optimal control approach. Proceedings of the American Control Conference. Vol. 2 1995. pp. 1289-1293
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