Increased field-emission site density from regrown carbon nanotube films

Y. Y. Wang, S. Gupta, M. Liang, Robert Nemanich

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

Electron field-emission properties of as-grown, etched, and regrown carbon nanotube thin films were investigated. The aligned carbon nanotube films were deposited by the microwave plasma-assisted chemical vapor deposition technique. The surface of the as-grown film contained a carbon nanotube mat of amorphous carbon and entangled nanotubes with some tubes protruding from the surface. Hydrogen plasma etching resulted in the removal of the surface layer, and regrowth on the etched surface displayed the formation of a new carbon nanotube mat. The emission site density and the current-voltage dependence of the field emission from all of the samples were analyzed. The results showed that the as-grown sample had a few strong emission spots and a relatively high emission current density (~20 μA cm2 at 1 Vμm), while the regrown sample exhibited a significantly increased emission site density.

Original languageEnglish (US)
Article number104309
JournalJournal of Applied Physics
Volume97
Issue number10
DOIs
StatePublished - May 15 2005
Externally publishedYes

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field emission
carbon nanotubes
hydrogen plasma
plasma etching
electron emission
nanotubes
surface layers
vapor deposition
current density
tubes
microwaves
electric potential
thin films

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Increased field-emission site density from regrown carbon nanotube films. / Wang, Y. Y.; Gupta, S.; Liang, M.; Nemanich, Robert.

In: Journal of Applied Physics, Vol. 97, No. 10, 104309, 15.05.2005.

Research output: Contribution to journalArticle

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