In situ X-ray reflectivity of indium supplied on GaN templates by metal organic vapor phase epitaxy

Guangxu Ju, Shingo Fuchi, Masao Tabuchi, Yoshikazu Takeda

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6 Scopus citations

Abstract

The indium supplied on c-plane GaN templates using Metal organic vapor phase epitaxy was studied by in situ X-ray reflectivity (XRR) at 800 °C. The presence of liquid indium layers on the GaN (0001) surface was demonstrated using data-fitting of XRR measurements, ex situ atomic force microscope, auger electron spectroscopy, and cross-sectional scanning electron microscope. These measurements demonstrated that a liquid indium layer coexisted with indium droplets on top of the GaN (0001) surface at 800 °C. The liquid indium film thicknesses increased with increasing TMIn supply time and did not change during cooling from 800 °C to room temperature.

Original languageEnglish (US)
Article number124906
JournalJournal of Applied Physics
Volume114
Issue number12
DOIs
StatePublished - Oct 17 2013

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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