Abstract

This paper presents a new method to manipulate microdevices’ membranes using nano-electrodeposits for directional microphones in hearing aid applications. The key to achieving high directionality is to minimize the mismatch of the omni-directional microphones using in-situ tuning by the integrated electrodeposition of metallic nanostructures. The nanostructures can be grown/retracted upon external bias at room temperature. The growth/retraction changes mass/stress distribution on the diaphragm of microdevices to precisely manipulate sensitivities to incoming acoustic waves. The omni-directional microphones are capacitive and have a parylene membrane integrated with the nanostructures. The microphone capacitance can be tuned up to 0.7 dB and acoustic mismatch reduces by 1.2 dB. This represents directivity index (DI) increase of 1.2 dB, which is crucial to achieve high directionality in composite microphones. The technology has many applications, including post-packaging trimming and calibration of micro-devices.

Original languageEnglish (US)
Title of host publication2008 Solid-State Sensors, Actuators, and Microsystems Workshop
EditorsLeland Spangler, Kimberly L. Turner
PublisherTransducer Research Foundation
Pages232-235
Number of pages4
ISBN (Electronic)9780964002494
StatePublished - Jan 1 2008
Event2008 Solid-State Sensors, Actuators, and Microsystems Workshop - Hilton Head Island, United States
Duration: Jun 1 2008Jun 5 2008

Publication series

NameTechnical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop

Conference

Conference2008 Solid-State Sensors, Actuators, and Microsystems Workshop
CountryUnited States
CityHilton Head Island
Period6/1/086/5/08

Fingerprint

Microphones
Tuning
Nanostructures
Membranes
Hearing aids
Trimming
Diaphragms
Electrodeposition
Stress concentration
Packaging
Capacitance
Acoustics
Acoustic waves
Calibration
Composite materials
Temperature

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Electrical and Electronic Engineering
  • Hardware and Architecture

Cite this

Je, S. S., Harrison, J. C., Kozicki, M., & Chae, J. (2008). In-situ tuning of microdevices for directional microphone applications. In L. Spangler, & K. L. Turner (Eds.), 2008 Solid-State Sensors, Actuators, and Microsystems Workshop (pp. 232-235). (Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop). Transducer Research Foundation.

In-situ tuning of microdevices for directional microphone applications. / Je, Sang Soo; Harrison, Jere C.; Kozicki, Michael; Chae, Junseok.

2008 Solid-State Sensors, Actuators, and Microsystems Workshop. ed. / Leland Spangler; Kimberly L. Turner. Transducer Research Foundation, 2008. p. 232-235 (Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Je, SS, Harrison, JC, Kozicki, M & Chae, J 2008, In-situ tuning of microdevices for directional microphone applications. in L Spangler & KL Turner (eds), 2008 Solid-State Sensors, Actuators, and Microsystems Workshop. Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop, Transducer Research Foundation, pp. 232-235, 2008 Solid-State Sensors, Actuators, and Microsystems Workshop, Hilton Head Island, United States, 6/1/08.
Je SS, Harrison JC, Kozicki M, Chae J. In-situ tuning of microdevices for directional microphone applications. In Spangler L, Turner KL, editors, 2008 Solid-State Sensors, Actuators, and Microsystems Workshop. Transducer Research Foundation. 2008. p. 232-235. (Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop).
Je, Sang Soo ; Harrison, Jere C. ; Kozicki, Michael ; Chae, Junseok. / In-situ tuning of microdevices for directional microphone applications. 2008 Solid-State Sensors, Actuators, and Microsystems Workshop. editor / Leland Spangler ; Kimberly L. Turner. Transducer Research Foundation, 2008. pp. 232-235 (Technical Digest - Solid-State Sensors, Actuators, and Microsystems Workshop).
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