In situ low temperature As-doping of Ge films using As(SiH3)3 and As(GeH3)3: Fundamental properties and device prototypes

Chi Xu, J. D. Gallagher, P. M. Wallace, C. L. Senaratne, P. Sims, Jose Menendez, John Kouvetakis

Research output: Contribution to journal › Article › peer-review

10 Scopus citations

Fingerprint

Dive into the research topics of 'In situ low temperature As-doping of Ge films using As(SiH3)3 and As(GeH3)3: Fundamental properties and device prototypes'. Together they form a unique fingerprint.

Chemical Compounds

Engineering & Materials Science

Physics & Astronomy