@inproceedings{8755814f697546a9b497cd639459d1f7,
title = "IN SITU ION IMPLANTATION FOR QUANTITATIVE SIMS ANALYSIS.",
abstract = "The primary ion column of a secondary ion mass spectrometer (Cameca IMS 3f) has been used as an ion implanter to prepare calibrated standards, in situ, for quantitative SIMS analysis, with an accuracy better than 10%. The technique has been used to determine oxygen concentrations in contaminated TiSi//2 films by implanting a reference level of 18//O into a portion of the film.",
author = "Lareau, {Richard T.} and Peter Williams",
year = "1985",
doi = "10.1557/proc-48-273",
language = "English (US)",
isbn = "0931837138",
series = "Materials Research Society Symposia Proceedings",
publisher = "Materials Research Soc",
pages = "273--279",
booktitle = "Materials Research Society Symposia Proceedings",
}