IN SITU ION IMPLANTATION FOR QUANTITATIVE SIMS ANALYSIS.

Richard T. Lareau, Peter Williams

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

Abstract

The primary ion column of a secondary ion mass spectrometer (Cameca IMS 3f) has been used as an ion implanter to prepare calibrated standards, in situ, for quantitative SIMS analysis, with an accuracy better than 10%. The technique has been used to determine oxygen concentrations in contaminated TiSi//2 films by implanting a reference level of 18//O into a portion of the film.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposia Proceedings
EditorsWilliam Katz, Peter Williams
Place of PublicationPittsburgh, PA, USA
PublisherMaterials Research Soc
Pages273-279
Number of pages7
Volume48
ISBN (Print)0931837138
StatePublished - 1985

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Secondary ion mass spectrometry
Ion implantation
Ions
Mass spectrometers
Oxygen

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Lareau, R. T., & Williams, P. (1985). IN SITU ION IMPLANTATION FOR QUANTITATIVE SIMS ANALYSIS. In W. Katz, & P. Williams (Eds.), Materials Research Society Symposia Proceedings (Vol. 48, pp. 273-279). Pittsburgh, PA, USA: Materials Research Soc.

IN SITU ION IMPLANTATION FOR QUANTITATIVE SIMS ANALYSIS. / Lareau, Richard T.; Williams, Peter.

Materials Research Society Symposia Proceedings. ed. / William Katz; Peter Williams. Vol. 48 Pittsburgh, PA, USA : Materials Research Soc, 1985. p. 273-279.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Lareau, RT & Williams, P 1985, IN SITU ION IMPLANTATION FOR QUANTITATIVE SIMS ANALYSIS. in W Katz & P Williams (eds), Materials Research Society Symposia Proceedings. vol. 48, Materials Research Soc, Pittsburgh, PA, USA, pp. 273-279.
Lareau RT, Williams P. IN SITU ION IMPLANTATION FOR QUANTITATIVE SIMS ANALYSIS. In Katz W, Williams P, editors, Materials Research Society Symposia Proceedings. Vol. 48. Pittsburgh, PA, USA: Materials Research Soc. 1985. p. 273-279
Lareau, Richard T. ; Williams, Peter. / IN SITU ION IMPLANTATION FOR QUANTITATIVE SIMS ANALYSIS. Materials Research Society Symposia Proceedings. editor / William Katz ; Peter Williams. Vol. 48 Pittsburgh, PA, USA : Materials Research Soc, 1985. pp. 273-279
@inproceedings{8755814f697546a9b497cd639459d1f7,
title = "IN SITU ION IMPLANTATION FOR QUANTITATIVE SIMS ANALYSIS.",
abstract = "The primary ion column of a secondary ion mass spectrometer (Cameca IMS 3f) has been used as an ion implanter to prepare calibrated standards, in situ, for quantitative SIMS analysis, with an accuracy better than 10{\%}. The technique has been used to determine oxygen concentrations in contaminated TiSi//2 films by implanting a reference level of 18//O into a portion of the film.",
author = "Lareau, {Richard T.} and Peter Williams",
year = "1985",
language = "English (US)",
isbn = "0931837138",
volume = "48",
pages = "273--279",
editor = "William Katz and Peter Williams",
booktitle = "Materials Research Society Symposia Proceedings",
publisher = "Materials Research Soc",

}

TY - GEN

T1 - IN SITU ION IMPLANTATION FOR QUANTITATIVE SIMS ANALYSIS.

AU - Lareau, Richard T.

AU - Williams, Peter

PY - 1985

Y1 - 1985

N2 - The primary ion column of a secondary ion mass spectrometer (Cameca IMS 3f) has been used as an ion implanter to prepare calibrated standards, in situ, for quantitative SIMS analysis, with an accuracy better than 10%. The technique has been used to determine oxygen concentrations in contaminated TiSi//2 films by implanting a reference level of 18//O into a portion of the film.

AB - The primary ion column of a secondary ion mass spectrometer (Cameca IMS 3f) has been used as an ion implanter to prepare calibrated standards, in situ, for quantitative SIMS analysis, with an accuracy better than 10%. The technique has been used to determine oxygen concentrations in contaminated TiSi//2 films by implanting a reference level of 18//O into a portion of the film.

UR - http://www.scopus.com/inward/record.url?scp=0022191438&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0022191438&partnerID=8YFLogxK

M3 - Conference contribution

SN - 0931837138

VL - 48

SP - 273

EP - 279

BT - Materials Research Society Symposia Proceedings

A2 - Katz, William

A2 - Williams, Peter

PB - Materials Research Soc

CY - Pittsburgh, PA, USA

ER -