In situ cleaning and characterization of oxygen- and zinc-terminated, n-type, ZnO{0001} surfaces

B. J. Coppa; C. C. Fulton; P. J. Hartlieb; R. F. Davis; B. J. Rodriguez; B. J. Shields; R. J. Nemanich

doi:10.1063/1.1695596

In situ cleaning and characterization of oxygen- and zinc-terminated, n-type, ZnO{0001} surfaces

B. J. Coppa, C. C. Fulton, P. J. Hartlieb, R. F. Davis, B. J. Rodriguez, B. J. Shields, R. J. Nemanich

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Abstract

Chemical etching and annealing under an unspecified ambient and pressure were used for the initial cleaning studies of ZnO single crystals. The traces of residual S and Cl from the chemical treatments in H ₂SO ₄ and HCl were revealed by the results of x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) of the ZnO(0001̄) surfaces. The surface microstructure is degraded by the thermal decomposition. The desorption of a delectable hydrocarbon species was the result of the exposure of the Zn surface to a remote plasma having an optimized He mixture for the optimized time, pressure and temperature.

Original language	English (US)
Pages (from-to)	5856-5864
Number of pages	9
Journal	Journal of Applied Physics
Volume	95
Issue number	10
DOIs	https://doi.org/10.1063/1.1695596
State	Published - May 15 2004
Externally published	Yes

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General Physics and Astronomy

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title = "In situ cleaning and characterization of oxygen- and zinc-terminated, n-type, ZnO{0001} surfaces",

abstract = "Chemical etching and annealing under an unspecified ambient and pressure were used for the initial cleaning studies of ZnO single crystals. The traces of residual S and Cl from the chemical treatments in H 2SO 4 and HCl were revealed by the results of x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) of the ZnO(000{\=1}) surfaces. The surface microstructure is degraded by the thermal decomposition. The desorption of a delectable hydrocarbon species was the result of the exposure of the Zn surface to a remote plasma having an optimized He mixture for the optimized time, pressure and temperature.",

author = "Coppa, {B. J.} and Fulton, {C. C.} and Hartlieb, {P. J.} and Davis, {R. F.} and Rodriguez, {B. J.} and Shields, {B. J.} and Nemanich, {R. J.}",

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T1 - In situ cleaning and characterization of oxygen- and zinc-terminated, n-type, ZnO{0001} surfaces

AU - Coppa, B. J.

AU - Fulton, C. C.

AU - Hartlieb, P. J.

AU - Davis, R. F.

AU - Rodriguez, B. J.

AU - Shields, B. J.

AU - Nemanich, R. J.

PY - 2004/5/15

Y1 - 2004/5/15

N2 - Chemical etching and annealing under an unspecified ambient and pressure were used for the initial cleaning studies of ZnO single crystals. The traces of residual S and Cl from the chemical treatments in H 2SO 4 and HCl were revealed by the results of x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) of the ZnO(0001̄) surfaces. The surface microstructure is degraded by the thermal decomposition. The desorption of a delectable hydrocarbon species was the result of the exposure of the Zn surface to a remote plasma having an optimized He mixture for the optimized time, pressure and temperature.

AB - Chemical etching and annealing under an unspecified ambient and pressure were used for the initial cleaning studies of ZnO single crystals. The traces of residual S and Cl from the chemical treatments in H 2SO 4 and HCl were revealed by the results of x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) of the ZnO(0001̄) surfaces. The surface microstructure is degraded by the thermal decomposition. The desorption of a delectable hydrocarbon species was the result of the exposure of the Zn surface to a remote plasma having an optimized He mixture for the optimized time, pressure and temperature.

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In situ cleaning and characterization of oxygen- and zinc-terminated, n-type, ZnO{0001} surfaces

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