In situ cleaning and characterization of oxygen- and zinc-terminated, n-type, ZnO{0001} surfaces

B. J. Coppa, C. C. Fulton, P. J. Hartlieb, R. F. Davis, B. J. Rodriguez, B. J. Shields, R. J. Nemanich

Research output: Contribution to journalArticlepeer-review

76 Scopus citations

Abstract

Chemical etching and annealing under an unspecified ambient and pressure were used for the initial cleaning studies of ZnO single crystals. The traces of residual S and Cl from the chemical treatments in H 2SO 4 and HCl were revealed by the results of x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) of the ZnO(0001̄) surfaces. The surface microstructure is degraded by the thermal decomposition. The desorption of a delectable hydrocarbon species was the result of the exposure of the Zn surface to a remote plasma having an optimized He mixture for the optimized time, pressure and temperature.

Original languageEnglish (US)
Pages (from-to)5856-5864
Number of pages9
JournalJournal of Applied Physics
Volume95
Issue number10
DOIs
StatePublished - May 15 2004
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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