In-Plane Laser Using Nanoimprint Lithography

Yong-Hang Zhang (Inventor)

Research output: Patent

Abstract

This invention relates to the fabrication of optoelectronic devices monolithically integrated with tailor-made high resolution structures, such as, in-plane distributed feedback and distributed Bragg reflector semiconductor lasers.
Original languageEnglish (US)
StatePublished - Feb 6 2004

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DBR lasers
inventions
optoelectronic devices
lithography
semiconductor lasers
fabrication
high resolution
lasers

Cite this

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title = "In-Plane Laser Using Nanoimprint Lithography",
abstract = "This invention relates to the fabrication of optoelectronic devices monolithically integrated with tailor-made high resolution structures, such as, in-plane distributed feedback and distributed Bragg reflector semiconductor lasers.",
author = "Yong-Hang Zhang",
year = "2004",
month = "2",
day = "6",
language = "English (US)",
type = "Patent",

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AB - This invention relates to the fabrication of optoelectronic devices monolithically integrated with tailor-made high resolution structures, such as, in-plane distributed feedback and distributed Bragg reflector semiconductor lasers.

M3 - Patent

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