Abstract
One of the problems of doping profile measurements using CV techniques is that numerical differentiation is required. This can, under certain circumstances, result in very noisy profiles. This paper presents a method of obtaining noise-free profiles by choosing a step size that takes account of the resolution of the capacitance meter to ensure that the maximum profile detail is retained. A range of other factors that can effect profiling accuracy are also reviewed.
Original language | English (US) |
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Pages (from-to) | 174-179 |
Number of pages | 6 |
Journal | IEEE Transactions on Electron Devices |
Volume | 35 |
Issue number | 2 |
DOIs | |
State | Published - Feb 1988 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering